Plasma radiation sources for X-ray lithography and neutron analysis applications
The main aim of this project was to develop soft x-ray point sources of sufficient power for application in SXR microelectronics lithography. The stated objective was to deliver l00-200W of SXR power, averaged over several minutes of burst duration, from a point source into 47~. The source was to be...
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Bibliographic Details
| Main Authors: |
Lee, Sing,
Wong, Terence Kin Shun,
Feng, Xianping,
Lee, Paul Choon Keat,
Springham, Stuart V.,
Serban, Adrian,
Liu, Mahe,
Kudryashov, Vladimir,
Gribkov, Vladimir A.,
Rajdeep Singh Rawat |
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| Other Authors: |
School of Electrical and Electronic Engineering |
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| Format: | Research Report
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| Published: |
2008
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| Subjects: | |
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| Online Access: | http://hdl.handle.net/10356/3020
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