Plasma radiation sources for X-ray lithography and neutron analysis applications
The main aim of this project was to develop soft x-ray point sources of sufficient power for application in SXR microelectronics lithography. The stated objective was to deliver l00-200W of SXR power, averaged over several minutes of burst duration, from a point source into 47~. The source was to be...
Main Authors: | , , , , , , , , , |
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Format: | Research Report |
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2008
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Online Access: | http://hdl.handle.net/10356/3020 |
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author | Lee, Sing Wong, Terence Kin Shun Feng, Xianping Lee, Paul Choon Keat Springham, Stuart V. Serban, Adrian Liu, Mahe Kudryashov, Vladimir Gribkov, Vladimir A. Rajdeep Singh Rawat |
author2 | School of Electrical and Electronic Engineering |
author_facet | School of Electrical and Electronic Engineering Lee, Sing Wong, Terence Kin Shun Feng, Xianping Lee, Paul Choon Keat Springham, Stuart V. Serban, Adrian Liu, Mahe Kudryashov, Vladimir Gribkov, Vladimir A. Rajdeep Singh Rawat |
author_sort | Lee, Sing |
collection | NTU |
description | The main aim of this project was to develop soft x-ray point sources of sufficient power for application in SXR microelectronics lithography. The stated objective was to deliver l00-200W of SXR power, averaged over several minutes of burst duration, from a point source into 47~. The source was to be based on a plasma focus. The second aim of this project was to carry out a feasibility study of the use of plasma fusion neutrons for activation analysis applications. |
first_indexed | 2024-10-01T04:42:17Z |
format | Research Report |
id | ntu-10356/3020 |
institution | Nanyang Technological University |
last_indexed | 2024-10-01T04:42:17Z |
publishDate | 2008 |
record_format | dspace |
spelling | ntu-10356/30202023-03-04T03:21:36Z Plasma radiation sources for X-ray lithography and neutron analysis applications Lee, Sing Wong, Terence Kin Shun Feng, Xianping Lee, Paul Choon Keat Springham, Stuart V. Serban, Adrian Liu, Mahe Kudryashov, Vladimir Gribkov, Vladimir A. Rajdeep Singh Rawat School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics The main aim of this project was to develop soft x-ray point sources of sufficient power for application in SXR microelectronics lithography. The stated objective was to deliver l00-200W of SXR power, averaged over several minutes of burst duration, from a point source into 47~. The source was to be based on a plasma focus. The second aim of this project was to carry out a feasibility study of the use of plasma fusion neutrons for activation analysis applications. ARC 5/94 2008-09-17T09:18:59Z 2008-09-17T09:18:59Z 1999 1999 Research Report http://hdl.handle.net/10356/3020 Nanyang Technological University application/pdf |
spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Lee, Sing Wong, Terence Kin Shun Feng, Xianping Lee, Paul Choon Keat Springham, Stuart V. Serban, Adrian Liu, Mahe Kudryashov, Vladimir Gribkov, Vladimir A. Rajdeep Singh Rawat Plasma radiation sources for X-ray lithography and neutron analysis applications |
title | Plasma radiation sources for X-ray lithography and neutron analysis applications |
title_full | Plasma radiation sources for X-ray lithography and neutron analysis applications |
title_fullStr | Plasma radiation sources for X-ray lithography and neutron analysis applications |
title_full_unstemmed | Plasma radiation sources for X-ray lithography and neutron analysis applications |
title_short | Plasma radiation sources for X-ray lithography and neutron analysis applications |
title_sort | plasma radiation sources for x ray lithography and neutron analysis applications |
topic | DRNTU::Engineering::Electrical and electronic engineering::Microelectronics |
url | http://hdl.handle.net/10356/3020 |
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