Plasma radiation sources for X-ray lithography and neutron analysis applications

The main aim of this project was to develop soft x-ray point sources of sufficient power for application in SXR microelectronics lithography. The stated objective was to deliver l00-200W of SXR power, averaged over several minutes of burst duration, from a point source into 47~. The source was to be...

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Main Authors: Lee, Sing, Wong, Terence Kin Shun, Feng, Xianping, Lee, Paul Choon Keat, Springham, Stuart V., Serban, Adrian, Liu, Mahe, Kudryashov, Vladimir, Gribkov, Vladimir A., Rajdeep Singh Rawat
Other Authors: School of Electrical and Electronic Engineering
Format: Research Report
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/3020
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author Lee, Sing
Wong, Terence Kin Shun
Feng, Xianping
Lee, Paul Choon Keat
Springham, Stuart V.
Serban, Adrian
Liu, Mahe
Kudryashov, Vladimir
Gribkov, Vladimir A.
Rajdeep Singh Rawat
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Lee, Sing
Wong, Terence Kin Shun
Feng, Xianping
Lee, Paul Choon Keat
Springham, Stuart V.
Serban, Adrian
Liu, Mahe
Kudryashov, Vladimir
Gribkov, Vladimir A.
Rajdeep Singh Rawat
author_sort Lee, Sing
collection NTU
description The main aim of this project was to develop soft x-ray point sources of sufficient power for application in SXR microelectronics lithography. The stated objective was to deliver l00-200W of SXR power, averaged over several minutes of burst duration, from a point source into 47~. The source was to be based on a plasma focus. The second aim of this project was to carry out a feasibility study of the use of plasma fusion neutrons for activation analysis applications.
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spelling ntu-10356/30202023-03-04T03:21:36Z Plasma radiation sources for X-ray lithography and neutron analysis applications Lee, Sing Wong, Terence Kin Shun Feng, Xianping Lee, Paul Choon Keat Springham, Stuart V. Serban, Adrian Liu, Mahe Kudryashov, Vladimir Gribkov, Vladimir A. Rajdeep Singh Rawat School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics The main aim of this project was to develop soft x-ray point sources of sufficient power for application in SXR microelectronics lithography. The stated objective was to deliver l00-200W of SXR power, averaged over several minutes of burst duration, from a point source into 47~. The source was to be based on a plasma focus. The second aim of this project was to carry out a feasibility study of the use of plasma fusion neutrons for activation analysis applications. ARC 5/94 2008-09-17T09:18:59Z 2008-09-17T09:18:59Z 1999 1999 Research Report http://hdl.handle.net/10356/3020 Nanyang Technological University application/pdf
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Lee, Sing
Wong, Terence Kin Shun
Feng, Xianping
Lee, Paul Choon Keat
Springham, Stuart V.
Serban, Adrian
Liu, Mahe
Kudryashov, Vladimir
Gribkov, Vladimir A.
Rajdeep Singh Rawat
Plasma radiation sources for X-ray lithography and neutron analysis applications
title Plasma radiation sources for X-ray lithography and neutron analysis applications
title_full Plasma radiation sources for X-ray lithography and neutron analysis applications
title_fullStr Plasma radiation sources for X-ray lithography and neutron analysis applications
title_full_unstemmed Plasma radiation sources for X-ray lithography and neutron analysis applications
title_short Plasma radiation sources for X-ray lithography and neutron analysis applications
title_sort plasma radiation sources for x ray lithography and neutron analysis applications
topic DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
url http://hdl.handle.net/10356/3020
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