Formation of silicon nodules and the different methods of removing them
Experiments have been done on the use of different metallization target, different metallization scheme and deposition temperature to characterize on the silicon nodule defect. This report summarizes on the investigation on the silicon precipitation problem.
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| Other Authors: | |
| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/3149 |
| _version_ | 1811681277807427584 |
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| author | Chan, Ching Kok. |
| author2 | Ahn Jaeshin |
| author_facet | Ahn Jaeshin Chan, Ching Kok. |
| author_sort | Chan, Ching Kok. |
| collection | NTU |
| description | Experiments have been done on the use of different metallization target, different metallization scheme and deposition temperature to characterize on the silicon nodule defect. This report summarizes on the investigation on the silicon precipitation problem. |
| first_indexed | 2024-10-01T03:38:24Z |
| format | Thesis |
| id | ntu-10356/3149 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T03:38:24Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/31492023-07-04T15:05:51Z Formation of silicon nodules and the different methods of removing them Chan, Ching Kok. Ahn Jaeshin School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits Experiments have been done on the use of different metallization target, different metallization scheme and deposition temperature to characterize on the silicon nodule defect. This report summarizes on the investigation on the silicon precipitation problem. Master of Science (Microelectronics) 2008-09-17T09:23:18Z 2008-09-17T09:23:18Z 2002 2002 Thesis http://hdl.handle.net/10356/3149 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits Chan, Ching Kok. Formation of silicon nodules and the different methods of removing them |
| title | Formation of silicon nodules and the different methods of removing them |
| title_full | Formation of silicon nodules and the different methods of removing them |
| title_fullStr | Formation of silicon nodules and the different methods of removing them |
| title_full_unstemmed | Formation of silicon nodules and the different methods of removing them |
| title_short | Formation of silicon nodules and the different methods of removing them |
| title_sort | formation of silicon nodules and the different methods of removing them |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits |
| url | http://hdl.handle.net/10356/3149 |
| work_keys_str_mv | AT chanchingkok formationofsiliconnodulesandthedifferentmethodsofremovingthem |