Study of roughness evolution during reactive ion etching

Study of roughness evolution during reactive ion etching

189 p.

Bibliographic Details
Main Author:	Santosh Kumar Pani
Other Authors:	K. Sudharsanam
Format:	Thesis
Published:	2010
Subjects:	DRNTU::Engineering::Materials::Plasma treatment
Online Access:	https://hdl.handle.net/10356/35966

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