Growth and characterization of low-k dielectrics for multilevel interconnect applications

Growth and characterization of low-k dielectrics for multilevel interconnect applications

This thesis focuses on the growth and characterization of carbon doped silicon oxide (SiO(C,H)) low k dielectrics for multilevel interconnect applications.

Bibliographic Details
Main Author: Wang, Minrui
Other Authors: Rusli
Format: Thesis
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
Online Access:https://hdl.handle.net/10356/3674

Internet

https://hdl.handle.net/10356/3674

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