Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides
Highly photosensitive sol-gel derived inorganic 0.2GeO2:0.8SiO2 (germanosilicate) films have been developed to simplify the fabrication of photonic devices using a single step direct UV-imprinting (DUI) technique. The KrF excimer laser (248 nm) light induced refractive index change (?n) of germanosi...
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| Format: | Thesis |
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2008
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| Online Access: | https://hdl.handle.net/10356/4113 |
| _version_ | 1811678831390490624 |
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| author | Rajni |
| author2 | Kantisara Pita |
| author_facet | Kantisara Pita Rajni |
| author_sort | Rajni |
| collection | NTU |
| description | Highly photosensitive sol-gel derived inorganic 0.2GeO2:0.8SiO2 (germanosilicate) films have been developed to simplify the fabrication of photonic devices using a single step direct UV-imprinting (DUI) technique. The KrF excimer laser (248 nm) light induced refractive index change (?n) of germanosilicate films has been investigated. The values of ?n increases with UV-illumination time, and saturated at ~ 0.0094 in case of densified thin films (~ 200 nm), and at ~ 0.005 in case of thick films (~ 3 µm). This high value of ?n is attributed to the creation of oxygen deficiency, and found to be high enough to form optical guiding channel. Photonic waveguide devices such as channel-waveguides, optical splitters and switches have been successfully fabricated using the DUI technique and the results are found to be in good agreement with the theoretical results. |
| first_indexed | 2024-10-01T02:59:31Z |
| format | Thesis |
| id | ntu-10356/4113 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T02:59:31Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/41132023-07-04T17:37:49Z Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides Rajni Kantisara Pita School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio Highly photosensitive sol-gel derived inorganic 0.2GeO2:0.8SiO2 (germanosilicate) films have been developed to simplify the fabrication of photonic devices using a single step direct UV-imprinting (DUI) technique. The KrF excimer laser (248 nm) light induced refractive index change (?n) of germanosilicate films has been investigated. The values of ?n increases with UV-illumination time, and saturated at ~ 0.0094 in case of densified thin films (~ 200 nm), and at ~ 0.005 in case of thick films (~ 3 µm). This high value of ?n is attributed to the creation of oxygen deficiency, and found to be high enough to form optical guiding channel. Photonic waveguide devices such as channel-waveguides, optical splitters and switches have been successfully fabricated using the DUI technique and the results are found to be in good agreement with the theoretical results. DOCTOR OF PHILOSOPHY (EEE) 2008-09-17T09:44:44Z 2008-09-17T09:44:44Z 2008 2008 Thesis Rajni. (2008). Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/4113 10.32657/10356/4113 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio Rajni Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides |
| title | Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides |
| title_full | Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides |
| title_fullStr | Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides |
| title_full_unstemmed | Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides |
| title_short | Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides |
| title_sort | development of highly photosensitive low loss inorganic sol gel films for direct ultraviolet imprinting of planar waveguides |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio |
| url | https://hdl.handle.net/10356/4113 |
| work_keys_str_mv | AT rajni developmentofhighlyphotosensitivelowlossinorganicsolgelfilmsfordirectultravioletimprintingofplanarwaveguides |