Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides
Highly photosensitive sol-gel derived inorganic 0.2GeO2:0.8SiO2 (germanosilicate) films have been developed to simplify the fabrication of photonic devices using a single step direct UV-imprinting (DUI) technique. The KrF excimer laser (248 nm) light induced refractive index change (?n) of germanosi...
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Thesis |
| Published: |
2008
|
| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/4113 |