Characterization and reliability studies of oxides grown by wet and dry oxidations for 0.25 micrometer CMOS technology

The main focus of this report is to improve the hot-carrier lifetime of a 0.25 micrometer CMOS device.

Bibliographic Details
Main Author: Chow, Yew Tuck.
Other Authors: Prasad, Krishnamachar
Format: Thesis
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/4166

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