Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD
In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films.
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Thesis |
| Published: |
2008
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/10356/4193 |
| _version_ | 1824456150789128192 |
|---|---|
| author | Cui, Jie. |
| author2 | Rusli |
| author_facet | Rusli Cui, Jie. |
| author_sort | Cui, Jie. |
| collection | NTU |
| description | In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films. |
| first_indexed | 2025-02-19T03:49:32Z |
| format | Thesis |
| id | ntu-10356/4193 |
| institution | Nanyang Technological University |
| last_indexed | 2025-02-19T03:49:32Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/41932023-07-04T15:01:48Z Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD Cui, Jie. Rusli School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials In this project, the electron cyclotron resonance chemical vapor deposition (ECR-CVD) techique has been successfully used to deposit a-Sii-xCx:H and nc-SiC:H films. Master of Engineering 2008-09-17T09:46:28Z 2008-09-17T09:46:28Z 2001 2001 Thesis http://hdl.handle.net/10356/4193 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials Cui, Jie. Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD |
| title | Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD |
| title_full | Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD |
| title_fullStr | Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD |
| title_full_unstemmed | Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD |
| title_short | Characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ECR-CVD |
| title_sort | characterization of hydrogenated amorphous and nanocrystalline silicon carbide deposited by ecr cvd |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials |
| url | http://hdl.handle.net/10356/4193 |
| work_keys_str_mv | AT cuijie characterizationofhydrogenatedamorphousandnanocrystallinesiliconcarbidedepositedbyecrcvd |