Preparation and characterization of amorphous SiCN films
In this project, a DC magnetron sputtering system with RF bias and a plasma enhanced electron cyclotron resonance chemical vapor deposition techniques have been successfully used to deposit a-SiCN films.
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/4277 |
| Summary: | In this project, a DC magnetron sputtering system with RF bias and a plasma enhanced electron cyclotron resonance chemical vapor deposition techniques have been successfully used to deposit a-SiCN films. |
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