Simulation and characterization of the inductive-coupled plasma chemical vapour deposition of nano-sized materials
The details of Inductively Coupled Plasma and Chemical Vapor Deposition and their integration is given. The details of PIC simulation are discussed. The results of characterization of the films formed making use of the optimum parameters is also discussed.
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/4312 |
| _version_ | 1826116781730693120 |
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| author | Asutosh Srivastava. |
| author2 | Tan, Ooi Kiang |
| author_facet | Tan, Ooi Kiang Asutosh Srivastava. |
| author_sort | Asutosh Srivastava. |
| collection | NTU |
| description | The details of Inductively Coupled Plasma and Chemical Vapor Deposition and their integration is given. The details of PIC simulation are discussed. The results of characterization of the films formed making use of the optimum parameters is also discussed. |
| first_indexed | 2024-10-01T04:16:59Z |
| format | Thesis |
| id | ntu-10356/4312 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T04:16:59Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/43122023-07-04T15:58:00Z Simulation and characterization of the inductive-coupled plasma chemical vapour deposition of nano-sized materials Asutosh Srivastava. Tan, Ooi Kiang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics The details of Inductively Coupled Plasma and Chemical Vapor Deposition and their integration is given. The details of PIC simulation are discussed. The results of characterization of the films formed making use of the optimum parameters is also discussed. Master of Engineering 2008-09-17T09:49:03Z 2008-09-17T09:49:03Z 2004 2004 Thesis http://hdl.handle.net/10356/4312 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics Asutosh Srivastava. Simulation and characterization of the inductive-coupled plasma chemical vapour deposition of nano-sized materials |
| title | Simulation and characterization of the inductive-coupled plasma chemical vapour deposition of nano-sized materials |
| title_full | Simulation and characterization of the inductive-coupled plasma chemical vapour deposition of nano-sized materials |
| title_fullStr | Simulation and characterization of the inductive-coupled plasma chemical vapour deposition of nano-sized materials |
| title_full_unstemmed | Simulation and characterization of the inductive-coupled plasma chemical vapour deposition of nano-sized materials |
| title_short | Simulation and characterization of the inductive-coupled plasma chemical vapour deposition of nano-sized materials |
| title_sort | simulation and characterization of the inductive coupled plasma chemical vapour deposition of nano sized materials |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics |
| url | http://hdl.handle.net/10356/4312 |
| work_keys_str_mv | AT asutoshsrivastava simulationandcharacterizationoftheinductivecoupledplasmachemicalvapourdepositionofnanosizedmaterials |