Deposition and characterization of metal-containing carbon (Me-c:h) films
The main objectives of this study are to deposit the above three Me-C:H, W-C:H, Mo-C:H and Ni-C:H films at different deposition conditions using our ECR-CVD system with a screen grid design and to conduct a comprehensive investigation in the three Me-C:H films.
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| Other Authors: | |
| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/4397 |
| _version_ | 1811681932150308864 |
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| author | Huang, Qingfeng. |
| author2 | Yoon, Soon Fatt |
| author_facet | Yoon, Soon Fatt Huang, Qingfeng. |
| author_sort | Huang, Qingfeng. |
| collection | NTU |
| description | The main objectives of this study are to deposit the above three Me-C:H, W-C:H, Mo-C:H and Ni-C:H films at different deposition conditions using our ECR-CVD system with a screen grid design and to conduct a comprehensive investigation in the three Me-C:H films. |
| first_indexed | 2024-10-01T03:48:48Z |
| format | Thesis |
| id | ntu-10356/4397 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T03:48:48Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/43972023-07-04T15:43:07Z Deposition and characterization of metal-containing carbon (Me-c:h) films Huang, Qingfeng. Yoon, Soon Fatt School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials The main objectives of this study are to deposit the above three Me-C:H, W-C:H, Mo-C:H and Ni-C:H films at different deposition conditions using our ECR-CVD system with a screen grid design and to conduct a comprehensive investigation in the three Me-C:H films. Doctor of Philosophy (EEE) 2008-09-17T09:50:42Z 2008-09-17T09:50:42Z 2002 2002 Thesis http://hdl.handle.net/10356/4397 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials Huang, Qingfeng. Deposition and characterization of metal-containing carbon (Me-c:h) films |
| title | Deposition and characterization of metal-containing carbon (Me-c:h) films |
| title_full | Deposition and characterization of metal-containing carbon (Me-c:h) films |
| title_fullStr | Deposition and characterization of metal-containing carbon (Me-c:h) films |
| title_full_unstemmed | Deposition and characterization of metal-containing carbon (Me-c:h) films |
| title_short | Deposition and characterization of metal-containing carbon (Me-c:h) films |
| title_sort | deposition and characterization of metal containing carbon me c h films |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials |
| url | http://hdl.handle.net/10356/4397 |
| work_keys_str_mv | AT huangqingfeng depositionandcharacterizationofmetalcontainingcarbonmechfilms |