Synthesis and characterization of epoxidized polyhedral oligomeric cubic silsesquioxanes (CSSQ) for UV curing applications

Polyhedral oligomeric silsesquioxanes (POSS) have emerged in recent years as a novel class of nanostructured organosilicon compounds which have been applied in the design of new inorganic-organic hybrid nanocomposite materials. The versatility of preparing POSS compounds functionalized with differen...

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Main Author: Yeo, Reuben Jueyuan.
Other Authors: Marc Jean Medard Abadie
Format: Final Year Project (FYP)
Language:English
Published: 2011
Subjects:
Online Access:http://hdl.handle.net/10356/44766
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author Yeo, Reuben Jueyuan.
author2 Marc Jean Medard Abadie
author_facet Marc Jean Medard Abadie
Yeo, Reuben Jueyuan.
author_sort Yeo, Reuben Jueyuan.
collection NTU
description Polyhedral oligomeric silsesquioxanes (POSS) have emerged in recent years as a novel class of nanostructured organosilicon compounds which have been applied in the design of new inorganic-organic hybrid nanocomposite materials. The versatility of preparing POSS compounds functionalized with different functional groups allows for the properties of such materials to be tailored for various applications. One such application that was explored is the design of UV-curable photoresists using epoxidized POSS incorporated into an epoxy resin. A general synthesis route was proposed in this work to prepare unfunctionalized cubic POSS (CSSQ), mono-epoxy and di-epoxy CSSQ via hydrolytic condensation of alkoxysilane precursors, which was followed by characterization to investigate their chemical and physical properties. Fourier-transformed infrared (FTIR) spectroscopy confirmed the presence of CSSQ and epoxidized CSSQ structures in the as-synthesized samples, although the presence of other cage structures of POSS in the samples were not determined. Thermogravimetric analyses (TGA) showed a higher thermal stability for epoxidized CSSQ compared to CSSQ, whereas X-ray diffraction (XRD) revealed an amorphous structure for epoxidized CSSQ. Differential photocalorimetry (DPC) was also performed on epoxidized CSSQ to study their UV curing kinetics. However, the epoxidized CSSQ samples were observed not to undergo photopolymerization under a strong intensity of UV irradiation (~800 mW/cm2), which could have been due to insufficient concentrations of photoinitiator used in the formulation. Subsequent studies could be done to further investigate the UV curing kinetics of epoxidized CSSQ.
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spelling ntu-10356/447662023-03-04T15:33:02Z Synthesis and characterization of epoxidized polyhedral oligomeric cubic silsesquioxanes (CSSQ) for UV curing applications Yeo, Reuben Jueyuan. Marc Jean Medard Abadie School of Materials Science and Engineering DRNTU::Engineering::Materials::Nanostructured materials DRNTU::Science::Chemistry::Organic chemistry::Organometallic compounds DRNTU::Engineering::Materials::Material testing and characterization Polyhedral oligomeric silsesquioxanes (POSS) have emerged in recent years as a novel class of nanostructured organosilicon compounds which have been applied in the design of new inorganic-organic hybrid nanocomposite materials. The versatility of preparing POSS compounds functionalized with different functional groups allows for the properties of such materials to be tailored for various applications. One such application that was explored is the design of UV-curable photoresists using epoxidized POSS incorporated into an epoxy resin. A general synthesis route was proposed in this work to prepare unfunctionalized cubic POSS (CSSQ), mono-epoxy and di-epoxy CSSQ via hydrolytic condensation of alkoxysilane precursors, which was followed by characterization to investigate their chemical and physical properties. Fourier-transformed infrared (FTIR) spectroscopy confirmed the presence of CSSQ and epoxidized CSSQ structures in the as-synthesized samples, although the presence of other cage structures of POSS in the samples were not determined. Thermogravimetric analyses (TGA) showed a higher thermal stability for epoxidized CSSQ compared to CSSQ, whereas X-ray diffraction (XRD) revealed an amorphous structure for epoxidized CSSQ. Differential photocalorimetry (DPC) was also performed on epoxidized CSSQ to study their UV curing kinetics. However, the epoxidized CSSQ samples were observed not to undergo photopolymerization under a strong intensity of UV irradiation (~800 mW/cm2), which could have been due to insufficient concentrations of photoinitiator used in the formulation. Subsequent studies could be done to further investigate the UV curing kinetics of epoxidized CSSQ. Bachelor of Engineering (Materials Engineering) 2011-06-03T08:04:05Z 2011-06-03T08:04:05Z 2011 2011 Final Year Project (FYP) http://hdl.handle.net/10356/44766 en Nanyang Technological University 43 p. application/pdf
spellingShingle DRNTU::Engineering::Materials::Nanostructured materials
DRNTU::Science::Chemistry::Organic chemistry::Organometallic compounds
DRNTU::Engineering::Materials::Material testing and characterization
Yeo, Reuben Jueyuan.
Synthesis and characterization of epoxidized polyhedral oligomeric cubic silsesquioxanes (CSSQ) for UV curing applications
title Synthesis and characterization of epoxidized polyhedral oligomeric cubic silsesquioxanes (CSSQ) for UV curing applications
title_full Synthesis and characterization of epoxidized polyhedral oligomeric cubic silsesquioxanes (CSSQ) for UV curing applications
title_fullStr Synthesis and characterization of epoxidized polyhedral oligomeric cubic silsesquioxanes (CSSQ) for UV curing applications
title_full_unstemmed Synthesis and characterization of epoxidized polyhedral oligomeric cubic silsesquioxanes (CSSQ) for UV curing applications
title_short Synthesis and characterization of epoxidized polyhedral oligomeric cubic silsesquioxanes (CSSQ) for UV curing applications
title_sort synthesis and characterization of epoxidized polyhedral oligomeric cubic silsesquioxanes cssq for uv curing applications
topic DRNTU::Engineering::Materials::Nanostructured materials
DRNTU::Science::Chemistry::Organic chemistry::Organometallic compounds
DRNTU::Engineering::Materials::Material testing and characterization
url http://hdl.handle.net/10356/44766
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