Fabrication and characterization of sputtered ZnO thin film for head-disk interface application
The increasing of hard disk capacities requires a decreasing flying height of hard disk drive slider. The active-head slider technology for hard disk drive is one of the most promising means to decrease flying height. In this study, ZnO thin films were deposited on Si and Al/SiO2/Si substrate using...
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| Other Authors: | |
| Format: | Final Year Project (FYP) |
| Language: | English |
| Published: |
2011
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| Online Access: | http://hdl.handle.net/10356/45236 |
| _version_ | 1811685036572803072 |
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| author | Yu, Xue. |
| author2 | Du Hejun |
| author_facet | Du Hejun Yu, Xue. |
| author_sort | Yu, Xue. |
| collection | NTU |
| description | The increasing of hard disk capacities requires a decreasing flying height of hard disk drive slider. The active-head slider technology for hard disk drive is one of the most promising means to decrease flying height. In this study, ZnO thin films were deposited on Si and Al/SiO2/Si substrate using RF Magnetron sputtering system. Then the effects of the process parameters on the property of ZnO films were investigated for various RF powers, working pressures and O2/(O2+Ar) gas ratios. The preferable parameters to produce high quality ZnO film will be presented. Two groups of piezoelectric cantilevers were fabricated to measure the piezoelectric coefficient of the fabricated ZnO film. The ZnO film in cantilever 1 was produced without oxygen and cantilever 2 produced under the preferable parameters found previously. The details steps to fabricate such cantilevers will be presented in this report. Laser Doppler vibrometer (LDV) was used to investigate the piezoelectric coefficients (d31) of ZnO film in each cantilever. The piezoelectric coefficients (d31) of ZnO film were found to be 0.166 pm/V and 3.2 pm/V respectively. |
| first_indexed | 2024-10-01T04:38:08Z |
| format | Final Year Project (FYP) |
| id | ntu-10356/45236 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T04:38:08Z |
| publishDate | 2011 |
| record_format | dspace |
| spelling | ntu-10356/452362023-03-04T18:32:39Z Fabrication and characterization of sputtered ZnO thin film for head-disk interface application Yu, Xue. Du Hejun School of Mechanical and Aerospace Engineering DRNTU::Engineering::Manufacturing DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films The increasing of hard disk capacities requires a decreasing flying height of hard disk drive slider. The active-head slider technology for hard disk drive is one of the most promising means to decrease flying height. In this study, ZnO thin films were deposited on Si and Al/SiO2/Si substrate using RF Magnetron sputtering system. Then the effects of the process parameters on the property of ZnO films were investigated for various RF powers, working pressures and O2/(O2+Ar) gas ratios. The preferable parameters to produce high quality ZnO film will be presented. Two groups of piezoelectric cantilevers were fabricated to measure the piezoelectric coefficient of the fabricated ZnO film. The ZnO film in cantilever 1 was produced without oxygen and cantilever 2 produced under the preferable parameters found previously. The details steps to fabricate such cantilevers will be presented in this report. Laser Doppler vibrometer (LDV) was used to investigate the piezoelectric coefficients (d31) of ZnO film in each cantilever. The piezoelectric coefficients (d31) of ZnO film were found to be 0.166 pm/V and 3.2 pm/V respectively. Bachelor of Engineering (Mechanical Engineering) 2011-06-10T03:41:04Z 2011-06-10T03:41:04Z 2011 2011 Final Year Project (FYP) http://hdl.handle.net/10356/45236 en Nanyang Technological University 68 p. application/pdf |
| spellingShingle | DRNTU::Engineering::Manufacturing DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Yu, Xue. Fabrication and characterization of sputtered ZnO thin film for head-disk interface application |
| title | Fabrication and characterization of sputtered ZnO thin film for head-disk interface application |
| title_full | Fabrication and characterization of sputtered ZnO thin film for head-disk interface application |
| title_fullStr | Fabrication and characterization of sputtered ZnO thin film for head-disk interface application |
| title_full_unstemmed | Fabrication and characterization of sputtered ZnO thin film for head-disk interface application |
| title_short | Fabrication and characterization of sputtered ZnO thin film for head-disk interface application |
| title_sort | fabrication and characterization of sputtered zno thin film for head disk interface application |
| topic | DRNTU::Engineering::Manufacturing DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films |
| url | http://hdl.handle.net/10356/45236 |
| work_keys_str_mv | AT yuxue fabricationandcharacterizationofsputteredznothinfilmforheaddiskinterfaceapplication |