Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films
In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials.
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/4588 |
| _version_ | 1811678201873694720 |
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| author | Lee, Yi Chau. |
| author2 | Tan, Ooi Kiang |
| author_facet | Tan, Ooi Kiang Lee, Yi Chau. |
| author_sort | Lee, Yi Chau. |
| collection | NTU |
| description | In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials. |
| first_indexed | 2024-10-01T02:49:30Z |
| format | Thesis |
| id | ntu-10356/4588 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T02:49:30Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/45882023-07-04T15:58:23Z Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films Lee, Yi Chau. Tan, Ooi Kiang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials In this work, we propose a custom-designed inductively coupled plasma chemical vapor deposition (ICP-CVD) system as an alternative manufacturing approach for nanostructured materials. Master of Engineering 2008-09-17T09:54:51Z 2008-09-17T09:54:51Z 2004 2004 Thesis http://hdl.handle.net/10356/4588 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials Lee, Yi Chau. Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
| title | Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
| title_full | Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
| title_fullStr | Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
| title_full_unstemmed | Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
| title_short | Inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
| title_sort | inductively coupled plasma chemical vapor deposition system for the synthesis of nanostructured thin films |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials |
| url | http://hdl.handle.net/10356/4588 |
| work_keys_str_mv | AT leeyichau inductivelycoupledplasmachemicalvapordepositionsystemforthesynthesisofnanostructuredthinfilms |