Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP
In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed.
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Thesis |
| Published: |
2008
|
| Subjects: | |
| Online Access: | http://hdl.handle.net/10356/4597 |
| _version_ | 1826119651683205120 |
|---|---|
| author | Leong, Daniel Woon Loong. |
| author2 | Ang, Ricky Lay Kee |
| author_facet | Ang, Ricky Lay Kee Leong, Daniel Woon Loong. |
| author_sort | Leong, Daniel Woon Loong. |
| collection | NTU |
| description | In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed. |
| first_indexed | 2024-10-01T05:03:35Z |
| format | Thesis |
| id | ntu-10356/4597 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T05:03:35Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/45972023-07-04T15:59:28Z Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP Leong, Daniel Woon Loong. Ang, Ricky Lay Kee School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed. Master of Engineering 2008-09-17T09:55:02Z 2008-09-17T09:55:02Z 2003 2003 Thesis http://hdl.handle.net/10356/4597 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics Leong, Daniel Woon Loong. Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP |
| title | Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP |
| title_full | Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP |
| title_fullStr | Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP |
| title_full_unstemmed | Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP |
| title_short | Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP |
| title_sort | optimization and comparison of argon plasma induced quantum well intermixing using rie and icp |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics |
| url | http://hdl.handle.net/10356/4597 |
| work_keys_str_mv | AT leongdanielwoonloong optimizationandcomparisonofargonplasmainducedquantumwellintermixingusingrieandicp |