Plasma soft X-ray source for microelectronic lithography

Plasma soft X-ray source for microelectronic lithography

266 p.

Bibliographic Details
Main Author:	Zhang, Gui Xin
Other Authors:	Lee Sing
Format:	Thesis
Published:	2011
Subjects:	DRNTU::Science
Online Access:	http://hdl.handle.net/10356/47512

Description
Summary:	266 p.