Variable angle spectroellipsometry of silicon based multilayers
In this project, LPCVD silicon nitride (SiNx), LPCVD polycrystalline silicon (poly-Si) films, wafer bonded (WB) silicon-on-insulator (SOI) substrate and separation-by-implantation-of-oxygen (SIMOX) silicon-on-insulator (SOI) substrates were non-destructively characterized by a horizontal variable an...
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/4797 |