Development of pulsed laser deposition system

Pulsed Laser Deposition (PLD) is an emerging technology, which is versatile tool for thin-film research. From the first found in years 1980’s, PLD system has received an intensive development due to its wide-range application in various areas of thin-film and multilayer research. The advantages of P...

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Bibliographic Details
Main Author: Nguyen Tien Duong
Other Authors: Tay Beng Kang
Format: Final Year Project (FYP)
Language:English
Published: 2012
Subjects:
Online Access:http://hdl.handle.net/10356/49693
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author Nguyen Tien Duong
author2 Tay Beng Kang
author_facet Tay Beng Kang
Nguyen Tien Duong
author_sort Nguyen Tien Duong
collection NTU
description Pulsed Laser Deposition (PLD) is an emerging technology, which is versatile tool for thin-film research. From the first found in years 1980’s, PLD system has received an intensive development due to its wide-range application in various areas of thin-film and multilayer research. The advantages of PLD system including the simplicity of the system and the ease of using external pulsed laser, which enable it to be used widely in thin-film deposition with different materials, stoichiometric transfer, fabricating artificially layered materials as well as metastable phases… In this project, a PLD system has been developed to enable researchers to prepare nano thin-films at different temperature conditions. An application in fabricating textured Carbon thin-film using this PLD system has been achieved. The result of this research in thin-film fabrication offers opportunity in new methodology of textured Carbon preparation technique.
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spelling ntu-10356/496932023-07-07T16:03:01Z Development of pulsed laser deposition system Nguyen Tien Duong Tay Beng Kang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Pulsed Laser Deposition (PLD) is an emerging technology, which is versatile tool for thin-film research. From the first found in years 1980’s, PLD system has received an intensive development due to its wide-range application in various areas of thin-film and multilayer research. The advantages of PLD system including the simplicity of the system and the ease of using external pulsed laser, which enable it to be used widely in thin-film deposition with different materials, stoichiometric transfer, fabricating artificially layered materials as well as metastable phases… In this project, a PLD system has been developed to enable researchers to prepare nano thin-films at different temperature conditions. An application in fabricating textured Carbon thin-film using this PLD system has been achieved. The result of this research in thin-film fabrication offers opportunity in new methodology of textured Carbon preparation technique. Bachelor of Engineering 2012-05-23T04:21:50Z 2012-05-23T04:21:50Z 2012 2012 Final Year Project (FYP) http://hdl.handle.net/10356/49693 en Nanyang Technological University 62 p. application/pdf
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Nguyen Tien Duong
Development of pulsed laser deposition system
title Development of pulsed laser deposition system
title_full Development of pulsed laser deposition system
title_fullStr Development of pulsed laser deposition system
title_full_unstemmed Development of pulsed laser deposition system
title_short Development of pulsed laser deposition system
title_sort development of pulsed laser deposition system
topic DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
url http://hdl.handle.net/10356/49693
work_keys_str_mv AT nguyentienduong developmentofpulsedlaserdepositionsystem