Sputtering and characterization of ZnO thin film for hard disk smart slider

In order to maximize the high storage capacity for hard disc, we need to adjust the flying height at lower position, because low position flying height can sense larger area of disc. When the recording density reaches 1Tb/in2 or more, the flying height will be only 1-2nm or less. This paper demonstr...

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Bibliographic Details
Main Author: Zhang, Hang
Other Authors: Du Hejun
Format: Final Year Project (FYP)
Language:English
Published: 2012
Subjects:
Online Access:http://hdl.handle.net/10356/50408
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author Zhang, Hang
author2 Du Hejun
author_facet Du Hejun
Zhang, Hang
author_sort Zhang, Hang
collection NTU
description In order to maximize the high storage capacity for hard disc, we need to adjust the flying height at lower position, because low position flying height can sense larger area of disc. When the recording density reaches 1Tb/in2 or more, the flying height will be only 1-2nm or less. This paper demonstrates the substrate dependency of zinc oxide growth in radio-frequency sputtering method. Different deposition conditions were carried out to find out the best operating parameters to grow a good quality ZnO thin film. ZnO thin films were deposited on Si and SiO2 substrate with Au layer using RF Magnetron sputtering system. The effect of RF powers, working pressure and O2/ (O2+Ar) gas ratios were studied and analyzed. The properties of the ZnO thin film was then characterized by using X-ray Diffractometer (XRD) and Field Emission Scanning Electron Microscopy (FESEM)/ Energy Dispersive X-ray (EDX).
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spelling ntu-10356/504082023-03-04T18:40:47Z Sputtering and characterization of ZnO thin film for hard disk smart slider Zhang, Hang Du Hejun School of Mechanical and Aerospace Engineering Centre for Mechanics of Micro-Systems DRNTU::Engineering::Mechanical engineering In order to maximize the high storage capacity for hard disc, we need to adjust the flying height at lower position, because low position flying height can sense larger area of disc. When the recording density reaches 1Tb/in2 or more, the flying height will be only 1-2nm or less. This paper demonstrates the substrate dependency of zinc oxide growth in radio-frequency sputtering method. Different deposition conditions were carried out to find out the best operating parameters to grow a good quality ZnO thin film. ZnO thin films were deposited on Si and SiO2 substrate with Au layer using RF Magnetron sputtering system. The effect of RF powers, working pressure and O2/ (O2+Ar) gas ratios were studied and analyzed. The properties of the ZnO thin film was then characterized by using X-ray Diffractometer (XRD) and Field Emission Scanning Electron Microscopy (FESEM)/ Energy Dispersive X-ray (EDX). Bachelor of Engineering (Mechanical Engineering) 2012-06-01T08:30:55Z 2012-06-01T08:30:55Z 2012 2012 Final Year Project (FYP) http://hdl.handle.net/10356/50408 en Nanyang Technological University 71 p. application/pdf
spellingShingle DRNTU::Engineering::Mechanical engineering
Zhang, Hang
Sputtering and characterization of ZnO thin film for hard disk smart slider
title Sputtering and characterization of ZnO thin film for hard disk smart slider
title_full Sputtering and characterization of ZnO thin film for hard disk smart slider
title_fullStr Sputtering and characterization of ZnO thin film for hard disk smart slider
title_full_unstemmed Sputtering and characterization of ZnO thin film for hard disk smart slider
title_short Sputtering and characterization of ZnO thin film for hard disk smart slider
title_sort sputtering and characterization of zno thin film for hard disk smart slider
topic DRNTU::Engineering::Mechanical engineering
url http://hdl.handle.net/10356/50408
work_keys_str_mv AT zhanghang sputteringandcharacterizationofznothinfilmforharddisksmartslider