Surface chemical study on the oxidation resistance of plasma-treated copper
In this article, we have also demonstrated the use of XPS, AES, FTIR, RS, XRD, TEM, FE-SEM for studying copper oxidation and, for the first time, studied the surface chemistry and oxidation-resistance of the C, N and Cu-containing films.
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/5054 |
| Summary: | In this article, we have also demonstrated the use of XPS, AES, FTIR, RS, XRD, TEM, FE-SEM for studying copper oxidation and, for the first time, studied the surface chemistry and oxidation-resistance of the C, N and Cu-containing films. |
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