Processing and characterization of low-k materials for ULSI application
In this project, chemical vapor deposited carbon doped oxide films, with dielectric constants in the range of 2.7 to 3.5 were studied.
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| Other Authors: | |
| Format: | Thesis |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/5060 |
| _version_ | 1824454494571724800 |
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| author | Widodo, Johnny. |
| author2 | Mhaisalkar, Subodh Gautam |
| author_facet | Mhaisalkar, Subodh Gautam Widodo, Johnny. |
| author_sort | Widodo, Johnny. |
| collection | NTU |
| description | In this project, chemical vapor deposited carbon doped oxide films, with dielectric constants in the range of 2.7 to 3.5 were studied. |
| first_indexed | 2025-02-19T03:23:12Z |
| format | Thesis |
| id | ntu-10356/5060 |
| institution | Nanyang Technological University |
| last_indexed | 2025-02-19T03:23:12Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/50602023-03-04T16:31:19Z Processing and characterization of low-k materials for ULSI application Widodo, Johnny. Mhaisalkar, Subodh Gautam School of Materials Science & Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects In this project, chemical vapor deposited carbon doped oxide films, with dielectric constants in the range of 2.7 to 3.5 were studied. Master of Engineering (SME) 2008-09-17T10:18:53Z 2008-09-17T10:18:53Z 2004 2004 Thesis http://hdl.handle.net/10356/5060 Nanyang Technological University 108 p. application/pdf |
| spellingShingle | DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects Widodo, Johnny. Processing and characterization of low-k materials for ULSI application |
| title | Processing and characterization of low-k materials for ULSI application |
| title_full | Processing and characterization of low-k materials for ULSI application |
| title_fullStr | Processing and characterization of low-k materials for ULSI application |
| title_full_unstemmed | Processing and characterization of low-k materials for ULSI application |
| title_short | Processing and characterization of low-k materials for ULSI application |
| title_sort | processing and characterization of low k materials for ulsi application |
| topic | DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects |
| url | http://hdl.handle.net/10356/5060 |
| work_keys_str_mv | AT widodojohnny processingandcharacterizationoflowkmaterialsforulsiapplication |