Characterisation and applications of chemically amplified photoresists for DUV microlithography

Characterisation and applications of chemically amplified photoresists for DUV microlithography

This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories.

Bibliographic Details
Main Author: Koh, Hui Peng.
Other Authors: Hu, Xiao
Format: Thesis
Language:English
Published: 2008
Subjects:
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
Online Access:http://hdl.handle.net/10356/5066
Description
Summary:This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories.

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