Characterisation and applications of chemically amplified photoresists for DUV microlithography
This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories.
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| Other Authors: | |
| Format: | Thesis |
| Language: | English |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/5066 |
| _version_ | 1826113999669821440 |
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| author | Koh, Hui Peng. |
| author2 | Hu, Xiao |
| author_facet | Hu, Xiao Koh, Hui Peng. |
| author_sort | Koh, Hui Peng. |
| collection | NTU |
| description | This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories. |
| first_indexed | 2024-10-01T03:31:59Z |
| format | Thesis |
| id | ntu-10356/5066 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T03:31:59Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/50662023-03-04T16:33:15Z Characterisation and applications of chemically amplified photoresists for DUV microlithography Koh, Hui Peng. Hu, Xiao School of Materials Science & Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects This project aims to elucidate factors contributing to the pattern roughness for sub-180nm gate patterning from the aspects of material properties, nature of the aerial image quality and processing histories. Master of Engineering (MSE) 2008-09-17T10:19:02Z 2008-09-17T10:19:02Z 2001 2001 Thesis http://hdl.handle.net/10356/5066 en Nanyang Technological University 153 p. application/pdf |
| spellingShingle | DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects Koh, Hui Peng. Characterisation and applications of chemically amplified photoresists for DUV microlithography |
| title | Characterisation and applications of chemically amplified photoresists for DUV microlithography |
| title_full | Characterisation and applications of chemically amplified photoresists for DUV microlithography |
| title_fullStr | Characterisation and applications of chemically amplified photoresists for DUV microlithography |
| title_full_unstemmed | Characterisation and applications of chemically amplified photoresists for DUV microlithography |
| title_short | Characterisation and applications of chemically amplified photoresists for DUV microlithography |
| title_sort | characterisation and applications of chemically amplified photoresists for duv microlithography |
| topic | DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects |
| url | http://hdl.handle.net/10356/5066 |
| work_keys_str_mv | AT kohhuipeng characterisationandapplicationsofchemicallyamplifiedphotoresistsforduvmicrolithography |