Defects of thin films on silicon wafer
Borophosphosilicate glass (BPSG) is a popular dielectric thin film used in the fabrication of semiconductor devices. However, the addition of dopants like boron and phosphorus creates some defects on these thin films and that reduces the reliability of IC devices. In this work, a systematic investig...
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Format: | Thesis |
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2008
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Online Access: | http://hdl.handle.net/10356/5111 |
Summary: | Borophosphosilicate glass (BPSG) is a popular dielectric thin film used in the fabrication of semiconductor devices. However, the addition of dopants like boron and phosphorus creates some defects on these thin films and that reduces the reliability of IC devices. In this work, a systematic investigation was carried out to characterize the defect in BPSG films. |
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