Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique
ZnO thin films were deposited on (100)Si substrates using filtered cathodic vacuum arc (FCVA) technique at various temperature (room temperature to 420 degree) and with different nitrogen to oxygen flow rate ratios (01. to 0.5) at 200 degree celsius.
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| Other Authors: | |
| Format: | Thesis |
| Language: | English |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/5124 |
| _version_ | 1826110352641753088 |
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| author | Tse, Kit Yan. |
| author2 | Hng, Huey Hoon |
| author_facet | Hng, Huey Hoon Tse, Kit Yan. |
| author_sort | Tse, Kit Yan. |
| collection | NTU |
| description | ZnO thin films were deposited on (100)Si substrates using filtered cathodic vacuum arc (FCVA) technique at various temperature (room temperature to 420 degree) and with different nitrogen to oxygen flow rate ratios (01. to 0.5) at 200 degree celsius. |
| first_indexed | 2024-10-01T02:33:00Z |
| format | Thesis |
| id | ntu-10356/5124 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T02:33:00Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/51242023-03-04T16:30:50Z Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique Tse, Kit Yan. Hng, Huey Hoon School of Materials Science & Engineering DRNTU::Engineering::Materials::Photonics and optoelectronics materials ZnO thin films were deposited on (100)Si substrates using filtered cathodic vacuum arc (FCVA) technique at various temperature (room temperature to 420 degree) and with different nitrogen to oxygen flow rate ratios (01. to 0.5) at 200 degree celsius. Master of Engineering (MSE) 2008-09-17T10:20:37Z 2008-09-17T10:20:37Z 2004 2004 Thesis http://hdl.handle.net/10356/5124 en Nanyang Technological University 112 p. application/pdf |
| spellingShingle | DRNTU::Engineering::Materials::Photonics and optoelectronics materials Tse, Kit Yan. Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique |
| title | Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique |
| title_full | Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique |
| title_fullStr | Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique |
| title_full_unstemmed | Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique |
| title_short | Characterisation of ZnO thin films produced by filtered cathodic vacuum arc technique |
| title_sort | characterisation of zno thin films produced by filtered cathodic vacuum arc technique |
| topic | DRNTU::Engineering::Materials::Photonics and optoelectronics materials |
| url | http://hdl.handle.net/10356/5124 |
| work_keys_str_mv | AT tsekityan characterisationofznothinfilmsproducedbyfilteredcathodicvacuumarctechnique |