Electrical properties and memory applications of Al-rich Al-based dielectric thin films
An AI-rich Al203 thin film was deposited on a p-type silicon substrate by rf sputtering to form AIIAI-rich AI20 3/p-Si diodes. The current-voltage (I-V) characteristics of the diodes were determined by carrier injection from either the Si substrate or the Al gate and by carrier transport along the t...
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| Format: | Thesis |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/54733 |