Defect pattern detection using a new rule-based approach
Automated inspection of semiconductor defect data has become increasingly important over the past several years as a means of quickly understanding and controlling contamination sources and process faults, which impact product yield. To address the issue of too much data and too little time, automat...
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| Format: | Thesis |
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2008
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| Online Access: | https://hdl.handle.net/10356/6209 |