Simulation and characterization of the process and circuit of the MOSFET device with ISRC structure
The main objectives of this project are examining and elucidating unique features of Ultra thin film MOSFET by TCAD tools and providing useful understanding and data that could be used in MOS device and circuit design and optimization for high performance, low voltage/power ICes.
Main Author: | Lee, Yong Kuen. |
---|---|
Other Authors: | School of Materials Science & Engineering |
Format: | Research Report |
Published: |
2008
|
Subjects: | |
Online Access: | http://hdl.handle.net/10356/6785 |
Similar Items
-
Analysis and characterization of ultra thin SOI MOSFET by MEDICI
by: Shin, Chang Yeop.
Published: (2008) -
Computer simulation and modelling of electrical characteristics of ferroelectric films for device applications
by: Lee, Teng Mong.
Published: (2008) -
Design, simulation and characterization of wheatstone bridge structured metal thin film uncooled microbolometer
by: Ang, Wan Chia, et al.
Published: (2015) -
Atomistic simulation of structure and mobility of dislocation in semiconductor
by: Choo, Zhi Min.
Published: (2008) -
Mechanical characterization and durability of thin-layered structures
by: Xu, Xiaojing.
Published: (2008)