Chemical vapor deposition growth and characterization of two-dimensional hexagonal boron nitride
Atomically thin hexagonal boron nitride (h-BN) film is a highly attractive dielectric and a crucial material for next-generation high performance two-dimensional (2D) heterostructure devices. In this thesis, controllable growth of 2D h-BN films on various substrates using chemical vapor deposition (...
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| Format: | Thesis |
| Language: | English |
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2016
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| Online Access: | http://hdl.handle.net/10356/69026 |