Reaction micro- and nano-imprint lithography with polymers

The objectives of the proposed Project are as follows: a) Development of High Aspect Ratio Micro- and Nano-Imprint Lithography for patterning over large surface areas. b) Development of soft-on-hard mold technology as an enabling technology for low pressure molding of high aspect ratio polymeri...

全面介绍

书目详细资料
主要作者: Chan, Mary Bee Eng.
其他作者: School of Mechanical and Production Engineering
格式: Research Report
出版: 2008
主题:
在线阅读:http://hdl.handle.net/10356/6969

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