Reaction micro- and nano-imprint lithography with polymers
The objectives of the proposed Project are as follows: a) Development of High Aspect Ratio Micro- and Nano-Imprint Lithography for patterning over large surface areas. b) Development of soft-on-hard mold technology as an enabling technology for low pressure molding of high aspect ratio polymeri...
主要作者: | Chan, Mary Bee Eng. |
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其他作者: | School of Mechanical and Production Engineering |
格式: | Research Report |
出版: |
2008
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主题: | |
在线阅读: | http://hdl.handle.net/10356/6969 |
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