Total Ionizing Dose (TID) Effects on Finger Transistors in a 65nm CMOS Process

Although Total Ionizing Dose (TID) effects are generally unpronounced in deep-submicron-CMOS, we show the TID-induced leakage current @TID=500Krad is significant in NMOS-finger-transistors of GlobalFoundries 65nm CMOS. Further, Radiation-Hardening-By-Design techniques against said TID effect are re...

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Main Authors: Jiang, Jize, Shu, Wei, Chong, Kwen-Siong, Lin, Tong, Lwin, Ne Kyaw Zwa, Chang, Joseph Sylvester, Liu, Jingyuan
Other Authors: School of Electrical and Electronic Engineering
Format: Conference Paper
Language:English
Published: 2016
Subjects:
Online Access:https://hdl.handle.net/10356/80395
http://hdl.handle.net/10220/41417
_version_ 1811691331271000064
author Jiang, Jize
Shu, Wei
Chong, Kwen-Siong
Lin, Tong
Lwin, Ne Kyaw Zwa
Chang, Joseph Sylvester
Liu, Jingyuan
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Jiang, Jize
Shu, Wei
Chong, Kwen-Siong
Lin, Tong
Lwin, Ne Kyaw Zwa
Chang, Joseph Sylvester
Liu, Jingyuan
author_sort Jiang, Jize
collection NTU
description Although Total Ionizing Dose (TID) effects are generally unpronounced in deep-submicron-CMOS, we show the TID-induced leakage current @TID=500Krad is significant in NMOS-finger-transistors of GlobalFoundries 65nm CMOS. Further, Radiation-Hardening-By-Design techniques against said TID effect are recommended.
first_indexed 2024-10-01T06:18:11Z
format Conference Paper
id ntu-10356/80395
institution Nanyang Technological University
language English
last_indexed 2024-10-01T06:18:11Z
publishDate 2016
record_format dspace
spelling ntu-10356/803952020-09-26T22:15:48Z Total Ionizing Dose (TID) Effects on Finger Transistors in a 65nm CMOS Process Jiang, Jize Shu, Wei Chong, Kwen-Siong Lin, Tong Lwin, Ne Kyaw Zwa Chang, Joseph Sylvester Liu, Jingyuan School of Electrical and Electronic Engineering 2016 IEEE International Symposium on Circuits and Systems (ISCAS) Temasek Laboratories MOSFET Leakage currents Although Total Ionizing Dose (TID) effects are generally unpronounced in deep-submicron-CMOS, we show the TID-induced leakage current @TID=500Krad is significant in NMOS-finger-transistors of GlobalFoundries 65nm CMOS. Further, Radiation-Hardening-By-Design techniques against said TID effect are recommended. Accepted version 2016-09-02T07:00:04Z 2019-12-06T13:48:30Z 2016-09-02T07:00:04Z 2019-12-06T13:48:30Z 2016 2016 Conference Paper Jiang, J., Shu, W., Chong, K.-S., Lin, T., Lwin, N. K. Z., Chang, J. S., et al. (2016). Total Ionizing Dose (TID) Effects on Finger Transistors in a 65nm CMOS Process. 2016 IEEE International Symposium on Circuits and Systems (ISCAS), 6-8. https://hdl.handle.net/10356/80395 http://hdl.handle.net/10220/41417 10.1109/ISCAS.2016.7527156 192455 en © 2016 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. The published version is available at: http://dx.doi.org/10.1109/ISCAS.2016.7527156. 4 p. application/pdf
spellingShingle MOSFET
Leakage currents
Jiang, Jize
Shu, Wei
Chong, Kwen-Siong
Lin, Tong
Lwin, Ne Kyaw Zwa
Chang, Joseph Sylvester
Liu, Jingyuan
Total Ionizing Dose (TID) Effects on Finger Transistors in a 65nm CMOS Process
title Total Ionizing Dose (TID) Effects on Finger Transistors in a 65nm CMOS Process
title_full Total Ionizing Dose (TID) Effects on Finger Transistors in a 65nm CMOS Process
title_fullStr Total Ionizing Dose (TID) Effects on Finger Transistors in a 65nm CMOS Process
title_full_unstemmed Total Ionizing Dose (TID) Effects on Finger Transistors in a 65nm CMOS Process
title_short Total Ionizing Dose (TID) Effects on Finger Transistors in a 65nm CMOS Process
title_sort total ionizing dose tid effects on finger transistors in a 65nm cmos process
topic MOSFET
Leakage currents
url https://hdl.handle.net/10356/80395
http://hdl.handle.net/10220/41417
work_keys_str_mv AT jiangjize totalionizingdosetideffectsonfingertransistorsina65nmcmosprocess
AT shuwei totalionizingdosetideffectsonfingertransistorsina65nmcmosprocess
AT chongkwensiong totalionizingdosetideffectsonfingertransistorsina65nmcmosprocess
AT lintong totalionizingdosetideffectsonfingertransistorsina65nmcmosprocess
AT lwinnekyawzwa totalionizingdosetideffectsonfingertransistorsina65nmcmosprocess
AT changjosephsylvester totalionizingdosetideffectsonfingertransistorsina65nmcmosprocess
AT liujingyuan totalionizingdosetideffectsonfingertransistorsina65nmcmosprocess