Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography
Long-range surface plasmon polariton (LRSPP) interference in a dielectric supported bimetal layer configuration is analyzed for nanoscale periodic feature fabrication. The single metal layer in a conventional configuration has been split into a bimetal layer configuration supported by a dielectric l...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2015
|
| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/81084 http://hdl.handle.net/10220/39118 |
| _version_ | 1826123209897934848 |
|---|---|
| author | Prabhathan, Patinharekandy Murukeshan, Vadakke Matham |
| author2 | School of Mechanical and Aerospace Engineering |
| author_facet | School of Mechanical and Aerospace Engineering Prabhathan, Patinharekandy Murukeshan, Vadakke Matham |
| author_sort | Prabhathan, Patinharekandy |
| collection | NTU |
| description | Long-range surface plasmon polariton (LRSPP) interference in a dielectric supported bimetal layer configuration is analyzed for nanoscale periodic feature fabrication. The single metal layer in a conventional configuration has been split into a bimetal layer configuration supported by a dielectric layer to enable LRSPP interference in different layers. It is shown that the configuration can be implemented in two different ways to record the interference pattern with high exposure depth and high contrast. Subwavelength periodic pattern having a half-pitch resolution of 65 nm at 446-nm wavelength is illustrated with the proposed two-beam and four-beam LRSPP interference configurations. |
| first_indexed | 2024-10-01T06:00:55Z |
| format | Journal Article |
| id | ntu-10356/81084 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T06:00:55Z |
| publishDate | 2015 |
| record_format | dspace |
| spelling | ntu-10356/810842023-03-04T17:13:14Z Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography Prabhathan, Patinharekandy Murukeshan, Vadakke Matham School of Mechanical and Aerospace Engineering Surface plasmons Plasmonics Nanolithography Long-range surface plasmon polariton (LRSPP) interference in a dielectric supported bimetal layer configuration is analyzed for nanoscale periodic feature fabrication. The single metal layer in a conventional configuration has been split into a bimetal layer configuration supported by a dielectric layer to enable LRSPP interference in different layers. It is shown that the configuration can be implemented in two different ways to record the interference pattern with high exposure depth and high contrast. Subwavelength periodic pattern having a half-pitch resolution of 65 nm at 446-nm wavelength is illustrated with the proposed two-beam and four-beam LRSPP interference configurations. MOE (Min. of Education, S’pore) Published version 2015-12-17T02:58:49Z 2019-12-06T14:21:04Z 2015-12-17T02:58:49Z 2019-12-06T14:21:04Z 2015 Journal Article Prabhathan, P., & Murukeshan, V. M. (2015). Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography. Optical Engineering, 54(9), 097107-. 0091-3286 https://hdl.handle.net/10356/81084 http://hdl.handle.net/10220/39118 10.1117/1.OE.54.9.097107 189846 en Optical Engineering © 2015 Society of Photo-optical Instrumentation Engineers.This paper was published in Optical Engineering and is made available as an electronic reprint (preprint) with permission of Society of Photo-optical Instrumentation Engineers. The published version is available at: [http://dx.doi.org/10.1117/1.OE.54.9.097107]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 4 p. application/pdf |
| spellingShingle | Surface plasmons Plasmonics Nanolithography Prabhathan, Patinharekandy Murukeshan, Vadakke Matham Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography |
| title | Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography |
| title_full | Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography |
| title_fullStr | Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography |
| title_full_unstemmed | Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography |
| title_short | Dielectric supported bimetal layer configuration for long-range surface plasmon polariton interference–based subwavelength lithography |
| title_sort | dielectric supported bimetal layer configuration for long range surface plasmon polariton interference based subwavelength lithography |
| topic | Surface plasmons Plasmonics Nanolithography |
| url | https://hdl.handle.net/10356/81084 http://hdl.handle.net/10220/39118 |
| work_keys_str_mv | AT prabhathanpatinharekandy dielectricsupportedbimetallayerconfigurationforlongrangesurfaceplasmonpolaritoninterferencebasedsubwavelengthlithography AT murukeshanvadakkematham dielectricsupportedbimetallayerconfigurationforlongrangesurfaceplasmonpolaritoninterferencebasedsubwavelengthlithography |