The Effect of Intrinsic Defects on Resistive Switching Based on p–n Heterojunction

We report a unidirectional bipolar resistive switching in an n-type GaO x /p-type NiO x heterojunction fabricated by magnetron sputtering at room temperature. The resistive switching (RS) of the heterojunction directly relate with the concentration of intrinsic defects in oxide, such as oxygen vacan...

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Päätekijät: Zheng, K., Sun, Xiao Wei, Teo, K. L.
Muut tekijät: School of Electrical and Electronic Engineering
Aineistotyyppi: Journal Article
Kieli:English
Julkaistu: 2015
Aiheet:
Linkit:https://hdl.handle.net/10356/81343
http://hdl.handle.net/10220/39214
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author Zheng, K.
Sun, Xiao Wei
Teo, K. L.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Zheng, K.
Sun, Xiao Wei
Teo, K. L.
author_sort Zheng, K.
collection NTU
description We report a unidirectional bipolar resistive switching in an n-type GaO x /p-type NiO x heterojunction fabricated by magnetron sputtering at room temperature. The resistive switching (RS) of the heterojunction directly relate with the concentration of intrinsic defects in oxide, such as oxygen vacancies and oxygen ions. Under external electric field, these electromigrated defects accumulate at the pn junction interface and modify the interface barrier, forming or rupturing the filamentary paths between n-GaO x and p-NiO x , leading to the switching between Ohmic and diode characteristics of the device.
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spelling ntu-10356/813432020-03-07T13:57:24Z The Effect of Intrinsic Defects on Resistive Switching Based on p–n Heterojunction Zheng, K. Sun, Xiao Wei Teo, K. L. School of Electrical and Electronic Engineering Heterojunction Interface Filament Resistive switching Intrinsic defects We report a unidirectional bipolar resistive switching in an n-type GaO x /p-type NiO x heterojunction fabricated by magnetron sputtering at room temperature. The resistive switching (RS) of the heterojunction directly relate with the concentration of intrinsic defects in oxide, such as oxygen vacancies and oxygen ions. Under external electric field, these electromigrated defects accumulate at the pn junction interface and modify the interface barrier, forming or rupturing the filamentary paths between n-GaO x and p-NiO x , leading to the switching between Ohmic and diode characteristics of the device. ASTAR (Agency for Sci., Tech. and Research, S’pore) 2015-12-23T08:08:09Z 2019-12-06T14:28:50Z 2015-12-23T08:08:09Z 2019-12-06T14:28:50Z 2013 Journal Article Zheng, K., Sun, X. W., & Teo, K. L. (2013). The Effect of Intrinsic Defects on Resistive Switching Based on p–n Heterojunction. Nanoscience and Nanotechnology Letters, 5(8), 868-871. 1941-4900 https://hdl.handle.net/10356/81343 http://hdl.handle.net/10220/39214 10.1166/nnl.2013.1626 en Nanoscience and Nanotechnology Letters © 2013 American Scientific Publishers.
spellingShingle Heterojunction
Interface
Filament
Resistive switching
Intrinsic defects
Zheng, K.
Sun, Xiao Wei
Teo, K. L.
The Effect of Intrinsic Defects on Resistive Switching Based on p–n Heterojunction
title The Effect of Intrinsic Defects on Resistive Switching Based on p–n Heterojunction
title_full The Effect of Intrinsic Defects on Resistive Switching Based on p–n Heterojunction
title_fullStr The Effect of Intrinsic Defects on Resistive Switching Based on p–n Heterojunction
title_full_unstemmed The Effect of Intrinsic Defects on Resistive Switching Based on p–n Heterojunction
title_short The Effect of Intrinsic Defects on Resistive Switching Based on p–n Heterojunction
title_sort effect of intrinsic defects on resistive switching based on p n heterojunction
topic Heterojunction
Interface
Filament
Resistive switching
Intrinsic defects
url https://hdl.handle.net/10356/81343
http://hdl.handle.net/10220/39214
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