Slurry flow visualisation of chemical mechanical polishing based on a computational fluid dynamics model
In this work, we developed a computational fluid dynamics (CFD) model to simulate the slurry flow between the wafers and pad during the chemical mechanical polishing (CMP) process under a multiple-wafer configuration. A serial of simulations were carried out to visualise slurry flow and explore the...
| Main Authors: | , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/85373 http://hdl.handle.net/10220/10684 |
| _version_ | 1826129926945767424 |
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| author | Tian, Y. B. Lai, S. T. Zhong, Z. W. |
| author2 | School of Mechanical and Aerospace Engineering |
| author_facet | School of Mechanical and Aerospace Engineering Tian, Y. B. Lai, S. T. Zhong, Z. W. |
| author_sort | Tian, Y. B. |
| collection | NTU |
| description | In this work, we developed a computational fluid dynamics (CFD) model to simulate the slurry flow between the wafers and pad during the chemical mechanical polishing (CMP) process under a multiple-wafer configuration. A serial of simulations were carried out to visualise slurry flow and explore the effects of the process variables concerned on the flow velocity and pressure distributions beneath the wafers. Through the model and simulation, the flow field characteristics were obtained and analyzed under different operating conditions. The results can provide an insight into a fundamental understanding of the slurry flow behaviours under the multiple-wafer configuration and some useful implications for the selection of practical polishing variables. |
| first_indexed | 2024-10-01T07:48:32Z |
| format | Journal Article |
| id | ntu-10356/85373 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T07:48:32Z |
| publishDate | 2013 |
| record_format | dspace |
| spelling | ntu-10356/853732020-03-07T12:47:13Z Slurry flow visualisation of chemical mechanical polishing based on a computational fluid dynamics model Tian, Y. B. Lai, S. T. Zhong, Z. W. School of Mechanical and Aerospace Engineering A*STAR SIMTech In this work, we developed a computational fluid dynamics (CFD) model to simulate the slurry flow between the wafers and pad during the chemical mechanical polishing (CMP) process under a multiple-wafer configuration. A serial of simulations were carried out to visualise slurry flow and explore the effects of the process variables concerned on the flow velocity and pressure distributions beneath the wafers. Through the model and simulation, the flow field characteristics were obtained and analyzed under different operating conditions. The results can provide an insight into a fundamental understanding of the slurry flow behaviours under the multiple-wafer configuration and some useful implications for the selection of practical polishing variables. 2013-06-26T02:15:31Z 2019-12-06T16:02:40Z 2013-06-26T02:15:31Z 2019-12-06T16:02:40Z 2012 2012 Journal Article Tian, Y. B., Lai, S. T., & Zhong, Z. W. (2012). Slurry Flow Visualisation of Chemical Mechanical Polishing Based on a Computational Fluid Dynamics Model. Advanced Materials Research, 565, 324-329. 1662-8985 https://hdl.handle.net/10356/85373 http://hdl.handle.net/10220/10684 10.4028/www.scientific.net/AMR.565.324 en Advanced materials research © 2012 Trans Tech Publications, Switzerland. |
| spellingShingle | Tian, Y. B. Lai, S. T. Zhong, Z. W. Slurry flow visualisation of chemical mechanical polishing based on a computational fluid dynamics model |
| title | Slurry flow visualisation of chemical mechanical polishing based on a computational fluid dynamics model |
| title_full | Slurry flow visualisation of chemical mechanical polishing based on a computational fluid dynamics model |
| title_fullStr | Slurry flow visualisation of chemical mechanical polishing based on a computational fluid dynamics model |
| title_full_unstemmed | Slurry flow visualisation of chemical mechanical polishing based on a computational fluid dynamics model |
| title_short | Slurry flow visualisation of chemical mechanical polishing based on a computational fluid dynamics model |
| title_sort | slurry flow visualisation of chemical mechanical polishing based on a computational fluid dynamics model |
| url | https://hdl.handle.net/10356/85373 http://hdl.handle.net/10220/10684 |
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