InAlN/GaN high electron mobility transistors on Si for RF applications
Conventional AlGaN/GaN High Electron Mobility Transistors (HEMTs) have been proven to be a strong competitor in both high voltage and high frequency applications resulting from the intrinsic material properties of GaN such as large bandgap, high electron mobility, high electron saturation velocity...
Main Author: | Xing, Weichuan |
---|---|
Other Authors: | Ng Geok Ing |
Format: | Thesis |
Language: | English |
Published: |
2018
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/88831 http://hdl.handle.net/10220/45971 |
Similar Items
-
Effect of OFF-state stress induced electric field on trapping in AlGaN/GaN high electron mobility transistors on Si (111)
by: Anand, M. J., et al.
Published: (2015) -
Studies of interface traps in GaN High-Electron-Mobility-Transistors (HEMTs)
by: Phia, Chen Yew
Published: (2020) -
Effect of post-deposition annealing on the interface electronic structures of Al2O3-Capped GaN and GaN/AlGaN/GaN heterostructure
by: Duan, Tian Li, et al.
Published: (2019) -
Studies of gallium nitride (GaN) based high electron mobility transistor (HEMTS)
by: Ong, Eugene Wei Han
Published: (2024) -
Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE
by: Agrawal, M., et al.
Published: (2011)