Phase shift reflectometry for wafer inspection
In 3D measurement, specular surfaces can be reconstructed by phase shift reflectometry and the system configuration is simple. In this paper, a wafer is measured for industrial inspection to make sure the quality of the wafer by calibrating, phase unwrapping, slope calculation and integration. The p...
| Main Authors: | , , , , , |
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| Other Authors: | |
| Format: | Conference Paper |
| Language: | English |
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2018
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| Online Access: | https://hdl.handle.net/10356/89019 http://hdl.handle.net/10220/47013 |
| _version_ | 1811680796511043584 |
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| author | Peng, Kuang Cao, Yiping Li, Hongru Sun, Jianfei Bourgade, Thomas Asundi, Anand Krishna |
| author2 | Asundi, Anand K. |
| author_facet | Asundi, Anand K. Peng, Kuang Cao, Yiping Li, Hongru Sun, Jianfei Bourgade, Thomas Asundi, Anand Krishna |
| author_sort | Peng, Kuang |
| collection | NTU |
| description | In 3D measurement, specular surfaces can be reconstructed by phase shift reflectometry and the system configuration is simple. In this paper, a wafer is measured for industrial inspection to make sure the quality of the wafer by calibrating, phase unwrapping, slope calculation and integration. The profile result of the whole wafer can be reconstructed and it is a curve. As the height of the structures on the wafer is the target we are interested in, by fitting and subtracting the curve surface, the structures on the wafer can be observed on the flat surface. To confirm the quality farther, a part of the wafer is captured and zoomed in to be detected so that the difference between two structures can be observed better. |
| first_indexed | 2024-10-01T03:30:45Z |
| format | Conference Paper |
| id | ntu-10356/89019 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T03:30:45Z |
| publishDate | 2018 |
| record_format | dspace |
| spelling | ntu-10356/890192023-03-04T17:07:14Z Phase shift reflectometry for wafer inspection Peng, Kuang Cao, Yiping Li, Hongru Sun, Jianfei Bourgade, Thomas Asundi, Anand Krishna Asundi, Anand K. Fu, Yu School of Mechanical and Aerospace Engineering Proceedings of SPIE - International Conference on Optical and Photonic Engineering (icOPEN2015) Centre for Optical and Laser Engineering Phase Shift Reflectometry DRNTU::Engineering::Mechanical engineering Specular Surface In 3D measurement, specular surfaces can be reconstructed by phase shift reflectometry and the system configuration is simple. In this paper, a wafer is measured for industrial inspection to make sure the quality of the wafer by calibrating, phase unwrapping, slope calculation and integration. The profile result of the whole wafer can be reconstructed and it is a curve. As the height of the structures on the wafer is the target we are interested in, by fitting and subtracting the curve surface, the structures on the wafer can be observed on the flat surface. To confirm the quality farther, a part of the wafer is captured and zoomed in to be detected so that the difference between two structures can be observed better. Published version 2018-12-17T08:28:26Z 2019-12-06T17:16:03Z 2018-12-17T08:28:26Z 2019-12-06T17:16:03Z 2015 Conference Paper Peng, K., Cao, Y., Li, H., Sun, J., Bourgade, T., & Asundi, A. K. (2015). Phase shift reflectometry for wafer inspection. Proceedings of SPIE - International Conference on Optical and Photonic Engineering (icOPEN2015), 9524, 95242T-. doi:10.1117/12.2190644 https://hdl.handle.net/10356/89019 http://hdl.handle.net/10220/47013 10.1117/12.2190644 en © 2015 Society of Photo-optical Instrumentation Engineers (SPIE). This paper was published in Proceedings of SPIE - International Conference on Optical and Photonic Engineering (icOPEN2015) and is made available as an electronic reprint (preprint) with permission of Society of Photo-optical Instrumentation Engineers (SPIE). The published version is available at: [http://dx.doi.org/10.1117/12.2190644]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 6 p. application/pdf |
| spellingShingle | Phase Shift Reflectometry DRNTU::Engineering::Mechanical engineering Specular Surface Peng, Kuang Cao, Yiping Li, Hongru Sun, Jianfei Bourgade, Thomas Asundi, Anand Krishna Phase shift reflectometry for wafer inspection |
| title | Phase shift reflectometry for wafer inspection |
| title_full | Phase shift reflectometry for wafer inspection |
| title_fullStr | Phase shift reflectometry for wafer inspection |
| title_full_unstemmed | Phase shift reflectometry for wafer inspection |
| title_short | Phase shift reflectometry for wafer inspection |
| title_sort | phase shift reflectometry for wafer inspection |
| topic | Phase Shift Reflectometry DRNTU::Engineering::Mechanical engineering Specular Surface |
| url | https://hdl.handle.net/10356/89019 http://hdl.handle.net/10220/47013 |
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