Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride

The direct growth of high-quality, large single-crystalline domains of graphene on a dielectric substrate is of vital importance for applications in electronics and optoelectronics. Traditionally, graphene domains grown on dielectrics are typically only ~1 μm with a growth rate of ~1 nm min−1 or les...

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Main Authors: Tang, Shujie, Wang, Haomin, Wang, Hui Shan, Sun, Qiujuan, Zhang, Xiuyun, Cong, Chunxiao, Xie, Hong, Liu, Xiaoyu, Zhou, Xiaohao, Huang, Fuqiang, Chen, Xiaoshuang, Yu, Ting, Ding, Feng, Xie, Xiaoming, Jiang, Mianheng
Other Authors: School of Physical and Mathematical Sciences
Format: Journal Article
Language:English
Published: 2018
Subjects:
Online Access:https://hdl.handle.net/10356/89338
http://hdl.handle.net/10220/46201
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author Tang, Shujie
Wang, Haomin
Wang, Hui Shan
Sun, Qiujuan
Zhang, Xiuyun
Cong, Chunxiao
Xie, Hong
Liu, Xiaoyu
Zhou, Xiaohao
Huang, Fuqiang
Chen, Xiaoshuang
Yu, Ting
Ding, Feng
Xie, Xiaoming
Jiang, Mianheng
author2 School of Physical and Mathematical Sciences
author_facet School of Physical and Mathematical Sciences
Tang, Shujie
Wang, Haomin
Wang, Hui Shan
Sun, Qiujuan
Zhang, Xiuyun
Cong, Chunxiao
Xie, Hong
Liu, Xiaoyu
Zhou, Xiaohao
Huang, Fuqiang
Chen, Xiaoshuang
Yu, Ting
Ding, Feng
Xie, Xiaoming
Jiang, Mianheng
author_sort Tang, Shujie
collection NTU
description The direct growth of high-quality, large single-crystalline domains of graphene on a dielectric substrate is of vital importance for applications in electronics and optoelectronics. Traditionally, graphene domains grown on dielectrics are typically only ~1 μm with a growth rate of ~1 nm min−1 or less, the main reason is the lack of a catalyst. Here we show that silane, serving as a gaseous catalyst, is able to boost the graphene growth rate to ~1 μm min−1, thereby promoting graphene domains up to 20 μm in size to be synthesized via chemical vapour deposition (CVD) on hexagonal boron nitride (h-BN). Hall measurements show that the mobility of the sample reaches 20,000 cm2 V−1 s−1 at room temperature, which is among the best for CVD-grown graphene. Combining the advantages of both catalytic CVD and the ultra-flat dielectric substrate, gaseous catalyst-assisted CVD paves the way for synthesizing high-quality graphene for device applications while avoiding the transfer process.
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spelling ntu-10356/893382023-02-28T19:36:13Z Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride Tang, Shujie Wang, Haomin Wang, Hui Shan Sun, Qiujuan Zhang, Xiuyun Cong, Chunxiao Xie, Hong Liu, Xiaoyu Zhou, Xiaohao Huang, Fuqiang Chen, Xiaoshuang Yu, Ting Ding, Feng Xie, Xiaoming Jiang, Mianheng School of Physical and Mathematical Sciences DRNTU::Science::Physics Quantum Hall Surfaces, Interfaces and Thin Films The direct growth of high-quality, large single-crystalline domains of graphene on a dielectric substrate is of vital importance for applications in electronics and optoelectronics. Traditionally, graphene domains grown on dielectrics are typically only ~1 μm with a growth rate of ~1 nm min−1 or less, the main reason is the lack of a catalyst. Here we show that silane, serving as a gaseous catalyst, is able to boost the graphene growth rate to ~1 μm min−1, thereby promoting graphene domains up to 20 μm in size to be synthesized via chemical vapour deposition (CVD) on hexagonal boron nitride (h-BN). Hall measurements show that the mobility of the sample reaches 20,000 cm2 V−1 s−1 at room temperature, which is among the best for CVD-grown graphene. Combining the advantages of both catalytic CVD and the ultra-flat dielectric substrate, gaseous catalyst-assisted CVD paves the way for synthesizing high-quality graphene for device applications while avoiding the transfer process. Published version 2018-10-03T05:29:47Z 2019-12-06T17:23:13Z 2018-10-03T05:29:47Z 2019-12-06T17:23:13Z 2015 Journal Article Tang, S., Wang, H., Wang, H. S., Sun, Q., Zhang, X., Cong, C., . . . Jiang, M. (2015). Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride. Nature Communications, 6, 6499-. doi:10.1038/ncomms7499 https://hdl.handle.net/10356/89338 http://hdl.handle.net/10220/46201 10.1038/ncomms7499 25757864 en Nature Communications © 2015 Macmillan Publishers Limited. This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ 7 p. application/pdf
spellingShingle DRNTU::Science::Physics
Quantum Hall
Surfaces, Interfaces and Thin Films
Tang, Shujie
Wang, Haomin
Wang, Hui Shan
Sun, Qiujuan
Zhang, Xiuyun
Cong, Chunxiao
Xie, Hong
Liu, Xiaoyu
Zhou, Xiaohao
Huang, Fuqiang
Chen, Xiaoshuang
Yu, Ting
Ding, Feng
Xie, Xiaoming
Jiang, Mianheng
Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride
title Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride
title_full Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride
title_fullStr Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride
title_full_unstemmed Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride
title_short Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride
title_sort silane catalysed fast growth of large single crystalline graphene on hexagonal boron nitride
topic DRNTU::Science::Physics
Quantum Hall
Surfaces, Interfaces and Thin Films
url https://hdl.handle.net/10356/89338
http://hdl.handle.net/10220/46201
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