Nanolithography of single-layer graphene oxide films by atomic force microscopy
Atomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squa...
| Main Authors: | , , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2012
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/94306 http://hdl.handle.net/10220/8603 |
| _version_ | 1811687480626249728 |
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| author | Lu, Gang Zhou, Xiaozhu Li, Hai Yin, Zongyou Li, Bing Huang, Ling Boey, Freddy Yin Chiang Zhang, Hua |
| author2 | School of Materials Science & Engineering |
| author_facet | School of Materials Science & Engineering Lu, Gang Zhou, Xiaozhu Li, Hai Yin, Zongyou Li, Bing Huang, Ling Boey, Freddy Yin Chiang Zhang, Hua |
| author_sort | Lu, Gang |
| collection | NTU |
| description | Atomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns as templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications. |
| first_indexed | 2024-10-01T05:16:59Z |
| format | Journal Article |
| id | ntu-10356/94306 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T05:16:59Z |
| publishDate | 2012 |
| record_format | dspace |
| spelling | ntu-10356/943062020-06-01T10:21:09Z Nanolithography of single-layer graphene oxide films by atomic force microscopy Lu, Gang Zhou, Xiaozhu Li, Hai Yin, Zongyou Li, Bing Huang, Ling Boey, Freddy Yin Chiang Zhang, Hua School of Materials Science & Engineering DRNTU::Engineering::Materials Atomic force microscopy-based nanolithography is used to generate the single-layer graphene oxide (GO) patterns on Si/SiO2 substrates. In this process, a Si tip is used to scratch GO films, resulting in GO-free trenches. Using this method, various single-layer GO patterns such as gaps, ribbons, squares, triangles, and zigzags can be easily fabricated. By using the GO patterns as templates, the hybrid GO-Ag nanoparticle patterns were obtained. Our study provides a flexible, simple, convenient method for generating GO patterns on solid substrates, which could be useful for graphene material-based device applications. 2012-09-24T00:51:29Z 2019-12-06T18:53:53Z 2012-09-24T00:51:29Z 2019-12-06T18:53:53Z 2010 2010 Journal Article Lu, G., Zhou, X., Li, H., Yin, Z., Li, B., Huang, L., et al. (2010). Nanolithography of single-layer graphene oxide films by atomic force microscopy. Langmuir, 26(9), 6164-6166. 0743-7463 https://hdl.handle.net/10356/94306 http://hdl.handle.net/10220/8603 10.1021/la101077t en Langmuir © 2010 American Chemical Society. |
| spellingShingle | DRNTU::Engineering::Materials Lu, Gang Zhou, Xiaozhu Li, Hai Yin, Zongyou Li, Bing Huang, Ling Boey, Freddy Yin Chiang Zhang, Hua Nanolithography of single-layer graphene oxide films by atomic force microscopy |
| title | Nanolithography of single-layer graphene oxide films by atomic force microscopy |
| title_full | Nanolithography of single-layer graphene oxide films by atomic force microscopy |
| title_fullStr | Nanolithography of single-layer graphene oxide films by atomic force microscopy |
| title_full_unstemmed | Nanolithography of single-layer graphene oxide films by atomic force microscopy |
| title_short | Nanolithography of single-layer graphene oxide films by atomic force microscopy |
| title_sort | nanolithography of single layer graphene oxide films by atomic force microscopy |
| topic | DRNTU::Engineering::Materials |
| url | https://hdl.handle.net/10356/94306 http://hdl.handle.net/10220/8603 |
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