Nickel silicide formation using multiple-pulsed laser annealing
The effect of multiple-pulsed laser irradiation on Ni silicide formation in Ni(Ti) /Si system was studied. A layered structure consisting of both crystalline NiSi2 and Ni-rich Ni–Si amorphous phases with a protective TiOx overlayer was formed after five-pulsed laser annealing at 0.4 J...
| Main Authors: | , , , , , |
|---|---|
| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2012
|
| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/94999 http://hdl.handle.net/10220/8009 |
| Summary: | The effect of multiple-pulsed laser irradiation on Ni silicide formation in Ni(Ti) /Si system was
studied. A layered structure consisting of both crystalline NiSi2 and Ni-rich Ni–Si amorphous phases
with a protective TiOx overlayer was formed after five-pulsed laser annealing at 0.4 J cm−2.
Different solidification velocities caused by a variation in the atomic concentration across the melt
have led to the formation of this layered structure. On the other hand, by increasing the number of
laser pulses, a continuous layer of polycrystalline NiSi was obtained after a 20-pulsed laser annealing at 0.3 J cm−2 laser fluence. Its formation is attributed to a better elemental mixing which
occurred during subsequent pulses. Enhancement of surface absorption and remelting of the phases
formed is proposed as the mechanism governing the continuous NiSi layer formation. |
|---|