Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography
The fabrication of arrays of sub-50-nm gold dots and line structures with deliberately designed 12−100-nm gaps is reported. These structures were made by initially using dip-pen nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid, on Au/Ti/SiOx/Si substrates and then using wet-c...
| Main Authors: | , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2012
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| Online Access: | https://hdl.handle.net/10356/95377 http://hdl.handle.net/10220/8574 |
| _version_ | 1811683065072713728 |
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| author | Mirkin, Chad A. Zhang, Hua Chung, Sung-Wook |
| author2 | School of Materials Science & Engineering |
| author_facet | School of Materials Science & Engineering Mirkin, Chad A. Zhang, Hua Chung, Sung-Wook |
| author_sort | Mirkin, Chad A. |
| collection | NTU |
| description | The fabrication of arrays of sub-50-nm gold dots and line structures with deliberately designed 12−100-nm gaps is reported. These structures were made by initially using dip-pen nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid, on Au/Ti/SiOx/Si substrates and then using wet-chemical etching to remove the exposed gold. |
| first_indexed | 2024-10-01T04:06:48Z |
| format | Journal Article |
| id | ntu-10356/95377 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T04:06:48Z |
| publishDate | 2012 |
| record_format | dspace |
| spelling | ntu-10356/953772020-06-01T10:13:34Z Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography Mirkin, Chad A. Zhang, Hua Chung, Sung-Wook School of Materials Science & Engineering DRNTU::Engineering::Materials The fabrication of arrays of sub-50-nm gold dots and line structures with deliberately designed 12−100-nm gaps is reported. These structures were made by initially using dip-pen nanolithography to pattern the etch resist, 16-mercaptohexadecanoic acid, on Au/Ti/SiOx/Si substrates and then using wet-chemical etching to remove the exposed gold. 2012-09-19T07:50:13Z 2019-12-06T19:13:43Z 2012-09-19T07:50:13Z 2019-12-06T19:13:43Z 2003 2003 Journal Article Zhang, H., Chung, S. W., & Mirkin, C. A. (2003). Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography. Nano Letters, 3(1), 43-45. 1530-6984 https://hdl.handle.net/10356/95377 http://hdl.handle.net/10220/8574 10.1021/nl0258473 en Nano letters © 2003 American Chemical Society. |
| spellingShingle | DRNTU::Engineering::Materials Mirkin, Chad A. Zhang, Hua Chung, Sung-Wook Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography |
| title | Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography |
| title_full | Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography |
| title_fullStr | Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography |
| title_full_unstemmed | Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography |
| title_short | Fabrication of sub-50-nm solid-state nanostructures on the basis of dip-pen nanolithography |
| title_sort | fabrication of sub 50 nm solid state nanostructures on the basis of dip pen nanolithography |
| topic | DRNTU::Engineering::Materials |
| url | https://hdl.handle.net/10356/95377 http://hdl.handle.net/10220/8574 |
| work_keys_str_mv | AT mirkinchada fabricationofsub50nmsolidstatenanostructuresonthebasisofdippennanolithography AT zhanghua fabricationofsub50nmsolidstatenanostructuresonthebasisofdippennanolithography AT chungsungwook fabricationofsub50nmsolidstatenanostructuresonthebasisofdippennanolithography |