An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering
Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5 nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigatio...
| Main Authors: | , , , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2012
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/95672 http://hdl.handle.net/10220/8288 |
| _version_ | 1826126110038949888 |
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| author | Yi, J. B. Zhou, Y. Z. Wee, A. T. S. Yu, X. J. Ding, Jun Chow, Gan Moog Dong, Zhili White, Timothy John Gao, Xing Yu |
| author2 | School of Materials Science & Engineering |
| author_facet | School of Materials Science & Engineering Yi, J. B. Zhou, Y. Z. Wee, A. T. S. Yu, X. J. Ding, Jun Chow, Gan Moog Dong, Zhili White, Timothy John Gao, Xing Yu |
| author_sort | Yi, J. B. |
| collection | NTU |
| description | Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5 nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigation (high-resolution TEM, EXAFS) reveals the presence of amorphous structure. The crystallinity increases with increasing film thickness, accompanied by an increase of magnetization. In 15 nm film or below, circular crystallites were found after annealing at 500 °C. Anisotropic magnetoresistance (AMR) has been observed and it is strongly dependent on the microstructure. |
| first_indexed | 2024-10-01T06:47:21Z |
| format | Journal Article |
| id | ntu-10356/95672 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T06:47:21Z |
| publishDate | 2012 |
| record_format | dspace |
| spelling | ntu-10356/956722023-07-14T15:44:47Z An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering Yi, J. B. Zhou, Y. Z. Wee, A. T. S. Yu, X. J. Ding, Jun Chow, Gan Moog Dong, Zhili White, Timothy John Gao, Xing Yu School of Materials Science & Engineering DRNTU::Engineering::Materials Ni films were deposited by magnetron sputtering with a relatively high deposition rate (0.5 nm/s). We have investigated the structure and magnetic properties of Ni films with different thicknesses. Strongly reduced magnetization has been found in the as-deposited Ni film. Our structural investigation (high-resolution TEM, EXAFS) reveals the presence of amorphous structure. The crystallinity increases with increasing film thickness, accompanied by an increase of magnetization. In 15 nm film or below, circular crystallites were found after annealing at 500 °C. Anisotropic magnetoresistance (AMR) has been observed and it is strongly dependent on the microstructure. Accepted version 2012-07-05T00:50:09Z 2019-12-06T19:19:32Z 2012-07-05T00:50:09Z 2019-12-06T19:19:32Z 2004 2004 Journal Article Yi, J. B., Zhou, Y. Z., Ding, J., Chow, G. M., Dong, Z. L., White, T., et al. (2004). An investigation of structure, magnectic properties and magnetoresistance of Ni films prepared by sputtering. Journal of Magnetism and Magnetic Materials, 284, 303-311. https://hdl.handle.net/10356/95672 http://hdl.handle.net/10220/8288 10.1016/j.jmmm.2004.06.052 en Journal of magnetism and magnetic materials © 2004 Elsevier. This is the author created version of a work that has been peer reviewed and accepted for publication by Journal of Magnetism and Magnetic Materials, Elsevier. It incorporates referee’s comments but changes resulting from the publishing process, such as copyediting, structural formatting, may not be reflected in this document. The published version is available at: http://dx.doi.org/10.1016/j.jmmm.2004.06.052. 26 p. application/pdf |
| spellingShingle | DRNTU::Engineering::Materials Yi, J. B. Zhou, Y. Z. Wee, A. T. S. Yu, X. J. Ding, Jun Chow, Gan Moog Dong, Zhili White, Timothy John Gao, Xing Yu An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering |
| title | An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering |
| title_full | An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering |
| title_fullStr | An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering |
| title_full_unstemmed | An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering |
| title_short | An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering |
| title_sort | investigation of structure magnetic properties and magnetoresistance of ni films prepared by sputtering |
| topic | DRNTU::Engineering::Materials |
| url | https://hdl.handle.net/10356/95672 http://hdl.handle.net/10220/8288 |
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