Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor
Titanium nitride (TiN)/nickel (Ni) composite coatings were synthesized by plasma assisted metal-organic chemical vapour deposition (PAMOCVD) using organo-metallic and metal-organic complexes namely dichlorobis( 5- cyclopentadienyl)titanium (IV) for titanium and N,N'-ethylene-bis(2,4-pentanedion...
| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/95842 http://hdl.handle.net/10220/11352 |
| _version_ | 1826124112211214336 |
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| author | Maiyalagan, Thandavarayan Arockiasamy, S. Kuppusami, P. Mallika, C. Nagaraja, K. S. |
| author2 | School of Chemical and Biomedical Engineering |
| author_facet | School of Chemical and Biomedical Engineering Maiyalagan, Thandavarayan Arockiasamy, S. Kuppusami, P. Mallika, C. Nagaraja, K. S. |
| author_sort | Maiyalagan, Thandavarayan |
| collection | NTU |
| description | Titanium nitride (TiN)/nickel (Ni) composite coatings were synthesized by plasma assisted metal-organic chemical vapour deposition (PAMOCVD) using organo-metallic and metal-organic complexes namely dichlorobis( 5- cyclopentadienyl)titanium (IV) for titanium and N,N'-ethylene-bis(2,4-pentanedion-iminoato)nickel(II) for nickel. The growth of such films was investigated in nitrogen (N2) plasma environment in the substrate temperature range of 450- 550ºC at a deposition pressure of 0.5-1 mbar. Prior to the deposition of films, the Ti precursor was subjected to the equilibrium vapour pressure measurements by employing TG/DTA in transpiration mode, which led to the value of 109.2 ± 5.6 kJ mol-1 for the standard enthalpy of sublimation (ΔHo sub). The phase identification using glancing incidence x-ray diffraction showed Ni/TiN is a nanocomposite coating containing nanocrystals of Ni and TiN with face centered cubic structure. Scanning electron microscopy revealed a uniform surface morphology of the films, while chemical analysis by energy dispersive analysis confirmed the presence of titanium, nickel and nitrogen in the composite films. |
| first_indexed | 2024-10-01T06:15:20Z |
| format | Journal Article |
| id | ntu-10356/95842 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T06:15:20Z |
| publishDate | 2013 |
| record_format | dspace |
| spelling | ntu-10356/958422020-03-07T11:35:35Z Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor Maiyalagan, Thandavarayan Arockiasamy, S. Kuppusami, P. Mallika, C. Nagaraja, K. S. School of Chemical and Biomedical Engineering Titanium nitride (TiN)/nickel (Ni) composite coatings were synthesized by plasma assisted metal-organic chemical vapour deposition (PAMOCVD) using organo-metallic and metal-organic complexes namely dichlorobis( 5- cyclopentadienyl)titanium (IV) for titanium and N,N'-ethylene-bis(2,4-pentanedion-iminoato)nickel(II) for nickel. The growth of such films was investigated in nitrogen (N2) plasma environment in the substrate temperature range of 450- 550ºC at a deposition pressure of 0.5-1 mbar. Prior to the deposition of films, the Ti precursor was subjected to the equilibrium vapour pressure measurements by employing TG/DTA in transpiration mode, which led to the value of 109.2 ± 5.6 kJ mol-1 for the standard enthalpy of sublimation (ΔHo sub). The phase identification using glancing incidence x-ray diffraction showed Ni/TiN is a nanocomposite coating containing nanocrystals of Ni and TiN with face centered cubic structure. Scanning electron microscopy revealed a uniform surface morphology of the films, while chemical analysis by energy dispersive analysis confirmed the presence of titanium, nickel and nitrogen in the composite films. 2013-07-15T02:08:43Z 2019-12-06T19:22:15Z 2013-07-15T02:08:43Z 2019-12-06T19:22:15Z 2012 2012 Journal Article Arockiasamy, S., Maiyalagan, T., Kuppusami, P., Mallika, C.,& Nagaraja, K. (2012). Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor. Micro and nanosystems, 4(3), 199-207. 1876-4029 https://hdl.handle.net/10356/95842 http://hdl.handle.net/10220/11352 10.2174/1876402911204030199 en Micro and nanosystems © 2012 Bentham Science Publishers. |
| spellingShingle | Maiyalagan, Thandavarayan Arockiasamy, S. Kuppusami, P. Mallika, C. Nagaraja, K. S. Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor |
| title | Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor |
| title_full | Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor |
| title_fullStr | Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor |
| title_full_unstemmed | Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor |
| title_short | Deposition of Ni/TiN composite coatings by a plasma assisted MOCVD using an organometallic precursor |
| title_sort | deposition of ni tin composite coatings by a plasma assisted mocvd using an organometallic precursor |
| url | https://hdl.handle.net/10356/95842 http://hdl.handle.net/10220/11352 |
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