Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers
With many of research on Fourier transform IR (FTIR) on low-k materials, our experiments extended the FTIR spectroscopy application to characterization and analysis of the low-k dielectric thin film properties on patterned wafers. FTIR spectra on low-k materials were successfully captured under thre...
| Main Authors: | , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/96810 http://hdl.handle.net/10220/11660 |
| _version_ | 1811693657477087232 |
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| author | Huang, Maggie Y. M. Lam, Jeffrey Chorkeung Tan, Hao Zhang, Fan Sun, Handong Shen, Zexiang Mai, Zhihong |
| author2 | School of Physical and Mathematical Sciences |
| author_facet | School of Physical and Mathematical Sciences Huang, Maggie Y. M. Lam, Jeffrey Chorkeung Tan, Hao Zhang, Fan Sun, Handong Shen, Zexiang Mai, Zhihong |
| author_sort | Huang, Maggie Y. M. |
| collection | NTU |
| description | With many of research on Fourier transform IR (FTIR) on low-k materials, our experiments extended the FTIR spectroscopy application to characterization and analysis of the low-k dielectric thin film properties on patterned wafers. FTIR spectra on low-k materials were successfully captured under three sampling modes: reflection, attenuated total reflectance (ATR), and mapping mode. ATR mode is more suitable for CHx band than reflection mode due to its higher sensitivity in this range. FTIR spectroscopy signal analysis on mixed structures (metal and low-k dielectric material) on patterned wafers was also investigated with mapping mode. Based on our investigation, FTIR can be used for low-k material studies on patterned wafer. |
| first_indexed | 2024-10-01T06:55:10Z |
| format | Journal Article |
| id | ntu-10356/96810 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T06:55:10Z |
| publishDate | 2013 |
| record_format | dspace |
| spelling | ntu-10356/968102020-03-07T12:37:05Z Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers Huang, Maggie Y. M. Lam, Jeffrey Chorkeung Tan, Hao Zhang, Fan Sun, Handong Shen, Zexiang Mai, Zhihong School of Physical and Mathematical Sciences With many of research on Fourier transform IR (FTIR) on low-k materials, our experiments extended the FTIR spectroscopy application to characterization and analysis of the low-k dielectric thin film properties on patterned wafers. FTIR spectra on low-k materials were successfully captured under three sampling modes: reflection, attenuated total reflectance (ATR), and mapping mode. ATR mode is more suitable for CHx band than reflection mode due to its higher sensitivity in this range. FTIR spectroscopy signal analysis on mixed structures (metal and low-k dielectric material) on patterned wafers was also investigated with mapping mode. Based on our investigation, FTIR can be used for low-k material studies on patterned wafer. 2013-07-17T03:06:55Z 2019-12-06T19:35:20Z 2013-07-17T03:06:55Z 2019-12-06T19:35:20Z 2012 2012 Journal Article Lam, J. C., Tan, H., Huang, M. Y., Zhang, F., Sun, H., Shen, Z., et al. (2012). Fourier Transform Infrared Spectroscopy of Low-k Dielectric Material on Patterned Wafers. Japanese Journal of Applied Physics, 51. 0021-4922 https://hdl.handle.net/10356/96810 http://hdl.handle.net/10220/11660 10.1143/JJAP.51.111501 en Japanese journal of applied physics © 2012 The Japan Society of Applied Physics. |
| spellingShingle | Huang, Maggie Y. M. Lam, Jeffrey Chorkeung Tan, Hao Zhang, Fan Sun, Handong Shen, Zexiang Mai, Zhihong Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers |
| title | Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers |
| title_full | Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers |
| title_fullStr | Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers |
| title_full_unstemmed | Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers |
| title_short | Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers |
| title_sort | fourier transform infrared spectroscopy of low k dielectric material on patterned wafers |
| url | https://hdl.handle.net/10356/96810 http://hdl.handle.net/10220/11660 |
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