Fourier transform infrared spectroscopy of low-k dielectric material on patterned wafers
With many of research on Fourier transform IR (FTIR) on low-k materials, our experiments extended the FTIR spectroscopy application to characterization and analysis of the low-k dielectric thin film properties on patterned wafers. FTIR spectra on low-k materials were successfully captured under thre...
Main Authors: | Huang, Maggie Y. M., Lam, Jeffrey Chorkeung, Tan, Hao, Zhang, Fan, Sun, Handong, Shen, Zexiang, Mai, Zhihong |
---|---|
Other Authors: | School of Physical and Mathematical Sciences |
Format: | Journal Article |
Language: | English |
Published: |
2013
|
Online Access: | https://hdl.handle.net/10356/96810 http://hdl.handle.net/10220/11660 |
Similar Items
-
Evidence of ultra-low-k dielectric material degradation and nanostructure alteration of the Cu/ultra-low-k interconnects in time-dependent dielectric breakdown failure
by: Lam, Jeffrey C. K., et al.
Published: (2013) -
Infrared, correlation and fourier transform spectroscopy/
by: Mattson, James S.
Published: (1977) -
Fourier transform infrared (FTIR) spectroscopy
by: Mohamed, M. A., et al.
Published: (2017) -
Fundamentals of Fourier transform infrared spectroscopy /
by: 451153 Smith, Brian C.
Published: (1996) -
Chemical infrared fourier transform spectroscopy/
by: 220506 Griffiths, Peter Roughley
Published: (1975)