Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers

Conductance bistability in Pt/Si–vinylidene fluoride (VDF) oligomer–Au ferroelectric tunnel junction devices is demonstrated. I–V and C–V measurements reveal bistable conductance switching within biasing voltage of ±0.5V with stable memory retention up to 1 × 104 cycles. The memory element exhibits...

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Main Authors: Kusuma, Damar Yoga, Lee, Pooi See
Other Authors: School of Materials Science & Engineering
Format: Journal Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/97095
http://hdl.handle.net/10220/10458
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author Kusuma, Damar Yoga
Lee, Pooi See
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Kusuma, Damar Yoga
Lee, Pooi See
author_sort Kusuma, Damar Yoga
collection NTU
description Conductance bistability in Pt/Si–vinylidene fluoride (VDF) oligomer–Au ferroelectric tunnel junction devices is demonstrated. I–V and C–V measurements reveal bistable conductance switching within biasing voltage of ±0.5V with stable memory retention up to 1 × 104 cycles. The memory element exhibits a low switching voltage of ±1.0 V, coincides with the coercive field of the ferroelectric VDF oligomer monolayer films in use.
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spelling ntu-10356/970952020-06-01T10:13:35Z Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers Kusuma, Damar Yoga Lee, Pooi See School of Materials Science & Engineering Conductance bistability in Pt/Si–vinylidene fluoride (VDF) oligomer–Au ferroelectric tunnel junction devices is demonstrated. I–V and C–V measurements reveal bistable conductance switching within biasing voltage of ±0.5V with stable memory retention up to 1 × 104 cycles. The memory element exhibits a low switching voltage of ±1.0 V, coincides with the coercive field of the ferroelectric VDF oligomer monolayer films in use. 2013-06-17T07:15:00Z 2019-12-06T19:38:55Z 2013-06-17T07:15:00Z 2019-12-06T19:38:55Z 2012 2012 Journal Article Kusuma, D. Y., & Lee, P. S. (2012). Ferroelectric Tunnel Junction Memory Devices made from Monolayers of Vinylidene Fluoride Oligomers. Advanced Materials, 24(30), 4163-4169. 1521-4095 https://hdl.handle.net/10356/97095 http://hdl.handle.net/10220/10458 10.1002/adma.201104476 en Advanced materials © 2012 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.
spellingShingle Kusuma, Damar Yoga
Lee, Pooi See
Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title_full Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title_fullStr Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title_full_unstemmed Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title_short Ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
title_sort ferroelectric tunnel junction memory devices made from monolayers of vinylidene fluoride oligomers
url https://hdl.handle.net/10356/97095
http://hdl.handle.net/10220/10458
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AT leepooisee ferroelectrictunneljunctionmemorydevicesmadefrommonolayersofvinylidenefluorideoligomers