Nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide electrodes

The nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide (rGO) electrodes has been systematically studied on the basis of the cyclic voltammetry, Tafel plot, and chronoamperometry. Our results show that the experimental parameters including electrolyte concentration, de...

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Main Authors: Yan, Qingyu, Zhang, Hua, Wu, Shixin, Yin, Zongyou, He, Qiyuan, Lu, Gang
Other Authors: School of Materials Science & Engineering
Format: Journal Article
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/97142
http://hdl.handle.net/10220/10507
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author Yan, Qingyu
Zhang, Hua
Wu, Shixin
Yin, Zongyou
He, Qiyuan
Lu, Gang
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Yan, Qingyu
Zhang, Hua
Wu, Shixin
Yin, Zongyou
He, Qiyuan
Lu, Gang
author_sort Yan, Qingyu
collection NTU
description The nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide (rGO) electrodes has been systematically studied on the basis of the cyclic voltammetry, Tafel plot, and chronoamperometry. Our results show that the experimental parameters including electrolyte concentration, deposition potential, solution pH, and the presence of background electrolyte can determine the nucleation mechanism. Scanning electron microscopy is employed to study the nucleation and growth of Cu on rGO electrodes. This study is significant in development of the electrochemical method in practical applications based on the rGO electrodes.
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spelling ntu-10356/971422020-06-01T10:21:12Z Nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide electrodes Yan, Qingyu Zhang, Hua Wu, Shixin Yin, Zongyou He, Qiyuan Lu, Gang School of Materials Science & Engineering Centre for Biomimetic Sensor Science DRNTU::Engineering::Materials::Metallic materials The nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide (rGO) electrodes has been systematically studied on the basis of the cyclic voltammetry, Tafel plot, and chronoamperometry. Our results show that the experimental parameters including electrolyte concentration, deposition potential, solution pH, and the presence of background electrolyte can determine the nucleation mechanism. Scanning electron microscopy is employed to study the nucleation and growth of Cu on rGO electrodes. This study is significant in development of the electrochemical method in practical applications based on the rGO electrodes. 2013-06-20T04:10:21Z 2019-12-06T19:39:21Z 2013-06-20T04:10:21Z 2019-12-06T19:39:21Z 2011 2011 Journal Article Wu, S., Yin, Z., He, Q., Lu, G., Yan, Q., & Zhang, H. (2011). Nucleation Mechanism of Electrochemical Deposition of Cu on Reduced Graphene Oxide Electrodes. The Journal of Physical Chemistry C, 115(32), 15973-15979. 1932-7447 https://hdl.handle.net/10356/97142 http://hdl.handle.net/10220/10507 10.1021/jp201667p en The journal of physical chemistry C © 2011 American Chemical Society.
spellingShingle DRNTU::Engineering::Materials::Metallic materials
Yan, Qingyu
Zhang, Hua
Wu, Shixin
Yin, Zongyou
He, Qiyuan
Lu, Gang
Nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide electrodes
title Nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide electrodes
title_full Nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide electrodes
title_fullStr Nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide electrodes
title_full_unstemmed Nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide electrodes
title_short Nucleation mechanism of electrochemical deposition of Cu on reduced graphene oxide electrodes
title_sort nucleation mechanism of electrochemical deposition of cu on reduced graphene oxide electrodes
topic DRNTU::Engineering::Materials::Metallic materials
url https://hdl.handle.net/10356/97142
http://hdl.handle.net/10220/10507
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