Enhanced organic ferroelectric field effect transistor characteristics with strained poly(vinylidene fluoride-trifluoroethylene) dielectric

Poly(vinylidene fluoride-trifluoroethylene) (70–30 mol%) was used as the functional dielectric layer in organic ferroelectric field effect transistors (FeFET) for non-volatile memory applications. Thin P(VDF-TrFE) film samples spin-coated on metallized plastic substrates were stretch-annealed to att...

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Main Authors: Nguyen, Chien A., Mhaisalkar, Subodh Gautam, Ma, Jan, Lee, Pooi See
Other Authors: School of Materials Science & Engineering
Format: Journal Article
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/97215
http://hdl.handle.net/10220/10484
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author Nguyen, Chien A.
Mhaisalkar, Subodh Gautam
Ma, Jan
Lee, Pooi See
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Nguyen, Chien A.
Mhaisalkar, Subodh Gautam
Ma, Jan
Lee, Pooi See
author_sort Nguyen, Chien A.
collection NTU
description Poly(vinylidene fluoride-trifluoroethylene) (70–30 mol%) was used as the functional dielectric layer in organic ferroelectric field effect transistors (FeFET) for non-volatile memory applications. Thin P(VDF-TrFE) film samples spin-coated on metallized plastic substrates were stretch-annealed to attain a topographically flat-grain structure and greatly reduce the surface roughness and current leakage of semi-crystalline copolymer film, while enhancing the preferred β-phase of the ferroelectric films. Resultant ferroelectric properties (PR = |10| μC/cm2, EC = |50| MV/m) for samples simultaneously stretched (50–70% strain) and heated below the Curie transition (70 oC) were comparable to those resulting from high temperature annealing (>140 oC). The observed enhancements by heating and stretching were studied by vibration spectroscopy and showed mutual complementary effects of both processes. Organic FeFET fabricated by thermal evaporating pentacene on the smooth P(VDF-TrFE) films showed substantial improvement of semiconductor grain growth and enhanced electrical characteristics with promising non-volatile memory functionality.
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spelling ntu-10356/972152020-06-01T10:01:59Z Enhanced organic ferroelectric field effect transistor characteristics with strained poly(vinylidene fluoride-trifluoroethylene) dielectric Nguyen, Chien A. Mhaisalkar, Subodh Gautam Ma, Jan Lee, Pooi See School of Materials Science & Engineering DRNTU::Engineering::Manufacturing::Polymers and plastics Poly(vinylidene fluoride-trifluoroethylene) (70–30 mol%) was used as the functional dielectric layer in organic ferroelectric field effect transistors (FeFET) for non-volatile memory applications. Thin P(VDF-TrFE) film samples spin-coated on metallized plastic substrates were stretch-annealed to attain a topographically flat-grain structure and greatly reduce the surface roughness and current leakage of semi-crystalline copolymer film, while enhancing the preferred β-phase of the ferroelectric films. Resultant ferroelectric properties (PR = |10| μC/cm2, EC = |50| MV/m) for samples simultaneously stretched (50–70% strain) and heated below the Curie transition (70 oC) were comparable to those resulting from high temperature annealing (>140 oC). The observed enhancements by heating and stretching were studied by vibration spectroscopy and showed mutual complementary effects of both processes. Organic FeFET fabricated by thermal evaporating pentacene on the smooth P(VDF-TrFE) films showed substantial improvement of semiconductor grain growth and enhanced electrical characteristics with promising non-volatile memory functionality. 2013-06-19T03:56:55Z 2019-12-06T19:40:17Z 2013-06-19T03:56:55Z 2019-12-06T19:40:17Z 2008 2008 Journal Article Nguyen, C. A., Mhaisalkar, S. G., Ma, J., & Lee, P. S. (2008). Enhanced organic ferroelectric field effect transistor characteristics with strained poly(vinylidene fluoride-trifluoroethylene) dielectric. Organic electronics, 9(6), 1087-1092. 1566-1199 https://hdl.handle.net/10356/97215 http://hdl.handle.net/10220/10484 10.1016/j.orgel.2008.08.012 en Organic electronics © 2008 Elsevier B.V.
spellingShingle DRNTU::Engineering::Manufacturing::Polymers and plastics
Nguyen, Chien A.
Mhaisalkar, Subodh Gautam
Ma, Jan
Lee, Pooi See
Enhanced organic ferroelectric field effect transistor characteristics with strained poly(vinylidene fluoride-trifluoroethylene) dielectric
title Enhanced organic ferroelectric field effect transistor characteristics with strained poly(vinylidene fluoride-trifluoroethylene) dielectric
title_full Enhanced organic ferroelectric field effect transistor characteristics with strained poly(vinylidene fluoride-trifluoroethylene) dielectric
title_fullStr Enhanced organic ferroelectric field effect transistor characteristics with strained poly(vinylidene fluoride-trifluoroethylene) dielectric
title_full_unstemmed Enhanced organic ferroelectric field effect transistor characteristics with strained poly(vinylidene fluoride-trifluoroethylene) dielectric
title_short Enhanced organic ferroelectric field effect transistor characteristics with strained poly(vinylidene fluoride-trifluoroethylene) dielectric
title_sort enhanced organic ferroelectric field effect transistor characteristics with strained poly vinylidene fluoride trifluoroethylene dielectric
topic DRNTU::Engineering::Manufacturing::Polymers and plastics
url https://hdl.handle.net/10356/97215
http://hdl.handle.net/10220/10484
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