Nanohole structure as efficient antireflection layer for silicon solar cell fabricated by maskless laser annealing
In this paper, a uniform nanohole structure on silicon wafer is fabricated using the silver catalyst induced method. The optical properties of the silicon nanohole structure are studied systematically at different nanohole depths. The nanohole arrays demonstrate excellent antireflection property due...
| Main Authors: | , , , , , , , |
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| Other Authors: | |
| Format: | Conference Paper |
| Language: | English |
| Published: |
2013
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/97345 http://hdl.handle.net/10220/13165 |
| _version_ | 1811693884806266880 |
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| author | Hong, Lei Rusli Wang, Fei He, Lining Wang, Xincai Zheng, Hongyu Wang, Hao Yu, Hongyu |
| author2 | School of Electrical and Electronic Engineering |
| author_facet | School of Electrical and Electronic Engineering Hong, Lei Rusli Wang, Fei He, Lining Wang, Xincai Zheng, Hongyu Wang, Hao Yu, Hongyu |
| author_sort | Hong, Lei |
| collection | NTU |
| description | In this paper, a uniform nanohole structure on silicon wafer is fabricated using the silver catalyst induced method. The optical properties of the silicon nanohole structure are studied systematically at different nanohole depths. The nanohole arrays demonstrate excellent antireflection property due to its sub-wavelength structure with a low reflection loss of 4% for incident light within the wavelength range of 300-1100 nm. The angular dependence of reflectivity is also investigated. The average reflection decreases at first and then increases as the incident light deviated from normal, with a very lower reflectivity of 0.83% at an incident angle of 20°. The suppressed reflection indicates a strong light trapping ability of the nanohole structure, and provides a low cost method to enhance light absorption and performance for the solar cell application. |
| first_indexed | 2024-10-01T06:58:47Z |
| format | Conference Paper |
| id | ntu-10356/97345 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T06:58:47Z |
| publishDate | 2013 |
| record_format | dspace |
| spelling | ntu-10356/973452020-03-07T13:24:47Z Nanohole structure as efficient antireflection layer for silicon solar cell fabricated by maskless laser annealing Hong, Lei Rusli Wang, Fei He, Lining Wang, Xincai Zheng, Hongyu Wang, Hao Yu, Hongyu School of Electrical and Electronic Engineering IEEE Photovoltaic Specialists Conference (38th : 2012 : Austin, Texas, US) A*STAR SIMTech DRNTU::Engineering::Electrical and electronic engineering In this paper, a uniform nanohole structure on silicon wafer is fabricated using the silver catalyst induced method. The optical properties of the silicon nanohole structure are studied systematically at different nanohole depths. The nanohole arrays demonstrate excellent antireflection property due to its sub-wavelength structure with a low reflection loss of 4% for incident light within the wavelength range of 300-1100 nm. The angular dependence of reflectivity is also investigated. The average reflection decreases at first and then increases as the incident light deviated from normal, with a very lower reflectivity of 0.83% at an incident angle of 20°. The suppressed reflection indicates a strong light trapping ability of the nanohole structure, and provides a low cost method to enhance light absorption and performance for the solar cell application. 2013-08-16T04:20:50Z 2019-12-06T19:41:42Z 2013-08-16T04:20:50Z 2019-12-06T19:41:42Z 2011 2011 Conference Paper https://hdl.handle.net/10356/97345 http://hdl.handle.net/10220/13165 10.1109/PVSC.2012.6317965 en |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering Hong, Lei Rusli Wang, Fei He, Lining Wang, Xincai Zheng, Hongyu Wang, Hao Yu, Hongyu Nanohole structure as efficient antireflection layer for silicon solar cell fabricated by maskless laser annealing |
| title | Nanohole structure as efficient antireflection layer for silicon solar cell fabricated by maskless laser annealing |
| title_full | Nanohole structure as efficient antireflection layer for silicon solar cell fabricated by maskless laser annealing |
| title_fullStr | Nanohole structure as efficient antireflection layer for silicon solar cell fabricated by maskless laser annealing |
| title_full_unstemmed | Nanohole structure as efficient antireflection layer for silicon solar cell fabricated by maskless laser annealing |
| title_short | Nanohole structure as efficient antireflection layer for silicon solar cell fabricated by maskless laser annealing |
| title_sort | nanohole structure as efficient antireflection layer for silicon solar cell fabricated by maskless laser annealing |
| topic | DRNTU::Engineering::Electrical and electronic engineering |
| url | https://hdl.handle.net/10356/97345 http://hdl.handle.net/10220/13165 |
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