Effect of sputtering process parameters on the thermoelectric properties of P and N-type Bi2Te3 films

Effect of sputtering process parameters on the thermoelectric properties of P and N-type Bi2Te3 films

Thermoelectric is an ever evolving field that serves many critical needs (cooling and power generation) in the industry. The key objective of this work is to fabricate Bismuth Telluride (Bi2Te3) thin-films by varying the various process parameters using a radio-frequency (RF) magnetron sputtering di...

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Bibliographic Details
Main Authors: Arina, Fan, Shermin Chow Hui, Shamira, Banu Abdul Bari, Chia, Ai Lin, San, Ye Ko, Khong, Samuel, Sim, Jonathan, Ezhilvalavan, Santhiagu, Ma, Jan, Hoon, Heng Hui
Other Authors: School of Materials Science & Engineering
Format: Journal Article
Language:English
Published: 2013
Online Access:https://hdl.handle.net/10356/97690
http://hdl.handle.net/10220/13209

Internet

https://hdl.handle.net/10356/97690
http://hdl.handle.net/10220/13209

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